Invention Grant
- Patent Title: Substrate table, a lithographic apparatus and a device manufacturing method
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Application No.: US15273416Application Date: 2016-09-22
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Publication No.: US09857696B2Publication Date: 2018-01-02
- Inventor: Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/58 ; G03F7/20
Abstract:
A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
Public/Granted literature
- US20170075232A1 SUBSTRATE TABLE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD Public/Granted day:2017-03-16
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