Invention Grant
- Patent Title: Imprint lithography
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Application No.: US13812844Application Date: 2011-06-14
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Publication No.: US09864279B2Publication Date: 2018-01-09
- Inventor: Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
- Applicant: Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2011/059831 WO 20110614
- International Announcement: WO2012/016744 WO 20120209
- Main IPC: G03B27/04
- IPC: G03B27/04 ; G03F7/20 ; B29C43/02 ; B29C43/14 ; B82Y10/00 ; B82Y40/00 ; G03F7/00 ; B29C43/04
Abstract:
An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
Public/Granted literature
- US20130182236A1 IMPRINT LITHOGRAPHY Public/Granted day:2013-07-18
Information query
