Invention Grant
- Patent Title: Gas injection system for ion beam device
-
Application No.: US15489182Application Date: 2017-04-17
-
Publication No.: US09865433B1Publication Date: 2018-01-09
- Inventor: Jay Wallace , Ernest E. Allen , Richard J. Hertel , Alexander C. Kontos , Shurong Liang , Jeffrey E. Krampert , Tyler Rockwell
- Applicant: Varian Semiconductor Equipment Associates, Inc.
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associats, Inc.
- Current Assignee: Varian Semiconductor Equipment Associats, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01J37/305

Abstract:
A gas injection system, including an extraction plate having an extraction aperture for allowing passage of an ion beam through the extraction plate, the extraction plate further having a gas slot for expulsion of a residue removal gas from the extraction plate. The gas injection system may include a gas conduit extending through the extraction plate between the gas slot and a gas manifold, a gas source connected in fluid communication with the gas manifold, the gas source containing the residue removal gas. The gas manifold may include a valve adjustable between a first position, wherein the residue removal gas is allowed to flow into the extraction plate, and a second portion, wherein the residue removal gas can be vented from the extraction plate. The gas injection system may further include a manifold cover coupled to the gas manifold.
Information query