Invention Grant
- Patent Title: Reticle chuck cleaner
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Application No.: US14664520Application Date: 2015-03-20
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Publication No.: US09884350B2Publication Date: 2018-02-06
- Inventor: Masamitsu Itoh , Katsuya Okumura , Taro Inada , Jun Watanabe
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Tokyo
- Assignee: Toshiba Memory Corporation
- Current Assignee: Toshiba Memory Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garret & Dunner, L.L.P.
- Priority: JP2010-169691 20100728
- Main IPC: C09J5/00
- IPC: C09J5/00 ; B08B7/00 ; G03F7/20 ; B05D3/02 ; B05D5/00
Abstract:
According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.
Public/Granted literature
- US20150190851A1 RETICLE CHUCK CLEANER Public/Granted day:2015-07-09
Information query
