Invention Grant
- Patent Title: Light-emitting device and manufacturing method thereof
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Application No.: US14636939Application Date: 2015-03-03
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Publication No.: US09887317B2Publication Date: 2018-02-06
- Inventor: Tien-Chang Lu , Chiao-Yun Chang , Heng Li
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Patterson + Sheridan, LLP
- Priority: TW103130523A 20140903
- Main IPC: H01L29/15
- IPC: H01L29/15 ; H01L33/06 ; H01L33/00 ; H01L33/12

Abstract:
A light-emitting device including a substrate; a first conductivity semiconductor layer disposed on the substrate; a first barrier disposed on the first conductivity semiconductor layer; a well disposed on the first barrier and including a first region having a first energy gap and a second region having a second energy gap and closer to the semiconductor layer than the first region; a second barrier disposed on the well; and a second conductivity semiconductor layer disposed on the second barrier; wherein the first energy gap decreases along a stacking direction of the light-emitting device and has a first gradient, the second energy gap increases along the stacking direction and has a second gradient, and an absolute value of the first gradient is smaller than an absolute value of the second gradient.
Public/Granted literature
- US20160064596A1 LIGHT-EMITTING DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2016-03-03
Information query
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