Invention Grant
- Patent Title: Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming
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Application No.: US14429512Application Date: 2013-07-15
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Publication No.: US09890255B2Publication Date: 2018-02-13
- Inventor: Hyun-Ji Song , Eun-Su Park , Sang-Hak Lim , Taek-Soo Kwak , Go-Un Kim , Mi-Young Kim , Bo-Sun Kim , Bong-Hwan Kim , Yoong-Hee Na , Jin-Hee Bae , Jin-Woo Seo , Hui-Chan Yun , Han-Song Lee , Jong-Dae Jeon , Kwen-Woo Han , Seung-Hee Hong , Byeong-Gyu Hwang
- Applicant: CHEIL INDUSTRIES INC.
- Applicant Address: KR Gumi-Si, Gyeongsangbuk-Do
- Assignee: CHEIL INDUSTRIES, INC.
- Current Assignee: CHEIL INDUSTRIES, INC.
- Current Assignee Address: KR Gumi-Si, Gyeongsangbuk-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2012-0158166 20121231
- International Application: PCT/KR2013/006291 WO 20130715
- International Announcement: WO2014/104510 WO 20140703
- Main IPC: C08G77/54
- IPC: C08G77/54 ; H01B3/46 ; C09D183/16 ; H01B3/30 ; H01B3/02 ; H01L21/02 ; C09D183/02 ; C09D183/14 ; C08G77/60 ; C08G77/62
Abstract:
Disclosed is modified hydrogenated polysiloxazane prepared by reacting hydrogenated polysiloxazane with a silane compound selected from polysilane, polycyclosilane, and a silane oligomer. The modified hydrogenated polysiloxazane has a small mole ratio of nitrogen atoms relative to silicon atoms and may remarkably deteriorate a film shrinkage ratio when included in a composition for forming a silica-based insulation layer to form a silica-based insulation layer.
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