Invention Grant
- Patent Title: Thermal conditioning unit, lithographic apparatus and device manufacturing method
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Application No.: US14395461Application Date: 2013-04-16
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Publication No.: US09891541B2Publication Date: 2018-02-13
- Inventor: Johannes Henricus Wilhelmus Jacobs , Jan Steven Christiaan Westerlaken
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- International Application: PCT/EP2013/057867 WO 20130416
- International Announcement: WO2013/171013 WO 20131121
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/58 ; G03F7/20 ; H01L21/67

Abstract:
A thermal conditioning unit to thermally condition a substrate, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.
Public/Granted literature
- US20150070666A1 THERMAL CONDITIONING UNIT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2015-03-12
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