Invention Grant
- Patent Title: Apparatus and method for treating graphene using plasma and application thereof
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Application No.: US14701471Application Date: 2015-04-30
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Publication No.: US09908779B2Publication Date: 2018-03-06
- Inventor: I-Chun Cheng , Jian-Zhang Chen , Cheng-Che Hsu , Pi-Tai Chou , Hsiao-Wei Liu , Haoming Chang , Sheng-Ping Liang , Ting-Jui Wu
- Applicant: NATIONAL TAIWAM UNIVERSITY
- Applicant Address: TW Taipei
- Assignee: NATIONAL TAIWAN UNIVERSITY
- Current Assignee: NATIONAL TAIWAN UNIVERSITY
- Current Assignee Address: TW Taipei
- Agency: The PL Law Group, PLLC
- Priority: TW103115622A 20140430
- Main IPC: B05D3/06
- IPC: B05D3/06 ; C01B31/04 ; C23C18/12 ; H01J37/32 ; C23C18/14 ; C23C4/134
Abstract:
A method and apparatus for treating graphene raw material by plasma, and an application thereof are provided. After treated by the plasma, the graphene raw material will have a special structure and characteristic.
Public/Granted literature
- US20150315026A1 APPARATUS AND METHOD FOR TREATING GRAPHENE USING PLASMA AND APPLICATION THEREOF Public/Granted day:2015-11-05
Information query
