Invention Grant
- Patent Title: Solid-state laser system and laser apparatus used for exposure apparatus
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Application No.: US15672754Application Date: 2017-08-09
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Publication No.: US09929529B2Publication Date: 2018-03-27
- Inventor: Takashi Onose , Osamu Wakabayashi
- Applicant: GIGAPHOTON INC.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: G02F1/35
- IPC: G02F1/35 ; H01S3/10 ; G02F1/37 ; H01S3/23

Abstract:
A solid-state laser system may include a first solid-state laser unit, a second solid-state laser unit, a wavelength conversion system, a wavelength detector, and a wavelength controller. The wavelength conversion system may receive a first pulsed laser light beam with a first wavelength and a second pulsed laser light beam with a second wavelength, and output a third pulsed laser light beam with a third wavelength converted from the first and second wavelengths. The wavelength controller may control the first solid-state laser unit to vary the first wavelength on a condition that an absolute value of a difference between a value of a target wavelength and a value of the third wavelength detected by the wavelength detector is equal to or less than a predetermined value, and control the second solid-state laser unit to vary the second wavelength on a condition that the absolute value exceeds the predetermined value.
Public/Granted literature
- US20170338619A1 SOLID-STATE LASER SYSTEM AND LASER APPARATUS USED FOR EXPOSURE APPARATUS Public/Granted day:2017-11-23
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