Invention Grant
- Patent Title: Method for manufacturing a substrate for surface-enhanced raman spectography and substrate
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Application No.: US14988064Application Date: 2016-01-05
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Publication No.: US09933354B2Publication Date: 2018-04-03
- Inventor: Stefan Landis , Vincent Reboud
- Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: FR Paris
- Assignee: COMMISSARIAT À L'ÉNERGIE ATOMIQUE ET AUX ÉNERGIES ALTERNATIVES
- Current Assignee: COMMISSARIAT À L'ÉNERGIE ATOMIQUE ET AUX ÉNERGIES ALTERNATIVES
- Current Assignee Address: FR Paris
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: FR1550012 20150105
- Main IPC: G01N21/65
- IPC: G01N21/65 ; G01N21/01 ; B82Y30/00 ; G01J3/44 ; B82Y15/00 ; B82Y20/00

Abstract:
A substrate for surface-enhanced Raman spectography includes a support including an upper surface; a multilayer deposited on the upper surface, with the multilayer including at least two metal layers separated from each other by an intermediate layer, the intermediate layer being selectively etchable with respect to the metal layers, the multilayer being passed through by at least one trench delimited by ends of each one of the layers of the multilayer, each end of each intermediate layer being set back with respect to the end of each metal layer adjacent to the intermediate layer in such a way that the ends of two successive metal layers form metal pins separated by a cavity; a reflective optical system arranged in each trench, with the reflective optical system being arranged to direct inside the cavities an incident light arriving according to an angle with respect to the upper surface of the support.
Public/Granted literature
- US20160195468A1 METHOD FOR MANUFACTURING A SUBSTRATE FOR SURFACE-ENHANCED RAMAN SPECTOGRAPHY AND SUBSTRATE Public/Granted day:2016-07-07
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