Invention Grant
- Patent Title: Hall effect device
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Application No.: US15793399Application Date: 2017-10-25
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Publication No.: US09935259B2Publication Date: 2018-04-03
- Inventor: Stefan Kolb , Markus Eckinger
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: G01R33/07
- IPC: G01R33/07 ; H01L27/22 ; H01L29/82 ; H01L43/06 ; H01L43/04 ; G01R33/00 ; H01L43/14

Abstract:
A hall effect device includes an active Hall region in a semiconductor substrate, and at least four terminal structures, each terminal structure including a switchable supply contact element and a sense contact element, wherein each supply contact element includes a transistor element with a first transistor terminal, a second transistor terminal, and a control terminal, wherein the second transistor terminal contacts the active Hall region or extends in the active Hall region; and wherein the sense contact elements are arranged in the active Hall region and neighboring to the switchable supply contact elements.
Public/Granted literature
- US20180047893A1 HALL EFFECT DEVICE Public/Granted day:2018-02-15
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