Invention Grant
- Patent Title: Method for producing a reflection-reducing layer system and reflection-reducing layer system
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Application No.: US15008392Application Date: 2016-01-27
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Publication No.: US09939556B2Publication Date: 2018-04-10
- Inventor: Ulrike Schulz , Friedrich Rickelt , Peter Munzert , Hanno Heiβe , Heiko Knopf , Kevin Füchsel , Norbert Kaiser
- Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
- Applicant Address: DE München
- Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
- Current Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
- Current Assignee Address: DE München
- Agency: Slater Matsil, LLP
- Priority: DE102015101135 20150127
- Main IPC: G02B1/10
- IPC: G02B1/10 ; G02B1/118 ; B29C59/14 ; G02B1/111 ; G02B1/14 ; B05D1/00 ; B05D3/14 ; C23C14/28 ; C23C14/06 ; C23C14/10 ; C23C14/12 ; C23C14/32

Abstract:
A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.
Public/Granted literature
- US20160216409A1 Method for Producing a Reflection-Reducing Layer System and Reflection-Reducing Layer System Public/Granted day:2016-07-28
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