Invention Grant
- Patent Title: Method of producing a semiconductor component arrangement comprising a trench transistor
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Application No.: US15197930Application Date: 2016-06-30
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Publication No.: US09941276B2Publication Date: 2018-04-10
- Inventor: Markus Zundel , Franz Hirler , Norbert Krischke
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE102006010510 20060307
- Main IPC: H01L27/07
- IPC: H01L27/07 ; H01L29/08 ; H01L21/74 ; H01L49/02 ; H01L29/40 ; H01L29/417 ; H01L29/66 ; H01L29/78 ; H01L29/94 ; H01L21/321 ; H01L21/02 ; H01L21/8234 ; H01L27/06 ; H01L29/10 ; H01L29/423 ; H01L29/06

Abstract:
A semiconductor component arrangement method includes producing a trench transistor structure including at least one trench disposed in the semiconductor body and at least one gate electrode disposed in the at least one trench. The method also includes producing a capacitor structure comprising an electrode structure disposed in at least one further trench, the electrode structure comprising at least one electrode. The gate electrode and the at least one electrode of the electrode structure are produced by common process steps.
Public/Granted literature
- US20160307889A1 Semiconductor Component Arrangement Comprising a Trench Transistor Public/Granted day:2016-10-20
Information query
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