Invention Grant
- Patent Title: Processing liquid supply apparatus, operating method of processing liquid supply apparatus, and recording medium
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Application No.: US15275588Application Date: 2016-09-26
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Publication No.: US09943871B2Publication Date: 2018-04-17
- Inventor: Hitoshi Hashima
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2015-190097 20150928; JP2016-176593 20160909
- Main IPC: B05B12/08
- IPC: B05B12/08 ; H01L21/67 ; B05B12/02 ; B05B12/00 ; G01N27/00

Abstract:
An electrode rod 71 serving as a first electrode is provided to be in contact with a flow path member and a processing liquid of a processing liquid supply path 2. If the processing liquid is flown in the processing liquid supply path 2, static electricity is generated by friction so that the processing liquid and the flow path member is electrically charged. By allowing the electrode rod 71 to be closely contacted with the flow path member, the amount of electric charges corresponding to the sum of the charge amounts of the processing liquid and the flow path member is measured as a surface potential of the first electrode by a surface potential measuring unit 77. The measured surface potential is displayed on a display unit 201.
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