Invention Grant
- Patent Title: Semiconductor device
-
Application No.: US15611855Application Date: 2017-06-02
-
Publication No.: US09991251B2Publication Date: 2018-06-05
- Inventor: Toshiyuki Nakaiso , Nobuo Sakai
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Nagaokakyo-Shi, Kyoto-Fu
- Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee Address: JP Nagaokakyo-Shi, Kyoto-Fu
- Agency: Arent Fox LLP
- Priority: JP2014-077102 20140403
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L27/08 ; H01G7/06 ; H01L29/93 ; B81B7/00 ; H01L49/02

Abstract:
A variable capacitance device that includes a semiconductor substrate, a redistribution layer disposed on a surface of the semiconductor substrate, and a plurality of terminal electrodes including first and second input/output terminals, a ground terminal and a control voltage application terminal. Moreover, a variable capacitance element section is formed in the redistribution layer from a pair of capacitor electrodes connected to the first and second input/output terminals, respectively, and a ferroelectric thin film disposed between the capacitor electrodes. Further, an ESD protection element is connected between the one of the input/output terminals and the ground terminal is formed on the surface of the semiconductor substrate.
Public/Granted literature
- US20170271318A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-09-21
Information query
IPC分类: