Invention Grant
- Patent Title: Semiconductor material doping
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Application No.: US15495169Application Date: 2017-04-24
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Publication No.: US09997667B2Publication Date: 2018-06-12
- Inventor: Maxim S. Shatalov , Remigijus Gaska , Jinwei Yang , Michael Shur , Alexander Dobrinsky
- Applicant: Sensor Electronic Technology, Inc.
- Applicant Address: US SC Columbia
- Assignee: Sensor Electronic Technology, Inc.
- Current Assignee: Sensor Electronic Technology, Inc.
- Current Assignee Address: US SC Columbia
- Agency: Labatt, LLC
- Main IPC: H01L33/06
- IPC: H01L33/06 ; H01L33/32 ; H01L33/00 ; H01L33/14

Abstract:
A solution for designing and/or fabricating a structure including a quantum well and an adjacent barrier is provided. A target band discontinuity between the quantum well and the adjacent barrier is selected to coincide with an activation energy of a dopant for the quantum well and/or barrier. For example, a target valence band discontinuity can be selected such that a dopant energy level of a dopant in the adjacent barrier coincides with a valence energy band edge for the quantum well and/or a ground state energy for free carriers in a valence energy band for the quantum well. Additionally, a target doping level for the quantum well and/or adjacent barrier can be selected to facilitate a real space transfer of holes across the barrier. The quantum well and the adjacent barrier can be formed such that the actual band discontinuity and/or actual doping level(s) correspond to the relevant target(s).
Public/Granted literature
- US20170229610A1 Semiconductor Material Doping Public/Granted day:2017-08-10
Information query
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