中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

3 records (took 0.027 seconds)

    GROOVED POLISHING PADS AND METHODS OF USE
    1.
    发明申请
    GROOVED POLISHING PADS AND METHODS OF USE 审中-公开
    沟槽抛光垫和使用方法

    公开(公告)号：WO0202279A2

    公开(公告)日：2002-01-10

    申请号：PCT/US0120904

    申请日：2001-06-29

    Applicant: IBM ,  CHEN SHYNG TSONG ,  DAVIS KENNETH M ,  RODBELL KENNETH P

    Inventor： CHEN SHYNG-TSONG ,  DAVIS KENNETH M ,  RODBELL KENNETH P

    IPC: B24B37/26 ,  B24D13/12 ,  B24D13/14 ,  B24D18/00 ,  H01L21/304 ,  B24B37/04

    CPC classification number: B24B37/26 ,  B24D18/00

    Abstract: Grooves are formed in a CMP (12) pad by positioning the pad on a supporting surface with a working surface (22) of the pad in spaced relation opposite to a router bit (24) and at least one projecting stop member (33) adjacent to the router bit, an outer end portion of the bit projecting beyond the stop. When the bit is rotated, relative axial movement between the bit and the pad causes the outer end portion of the bit to cut an initial recess in the pad. Relative lateral movement between the rotating bit and the pad then forms a groove which extends laterally away from the recess and has a depth substantially the same as that of the recess. Different lateral movements between the bit and the pad are used to form a variety of groove patterns, the depths of which are precisely controlled by the stop member(s). The grooves may be formed in the polishing surface and/or the rear opposite surface of the pad and passages may be provided for interconnecting the rear grooves with the polishing surface or the front grooves. Grooves in the polishing surface may be provided with outlets through which a polishing slurry may flow while the polishing surface is in contact with a workpiece surface.

    Abstract translation: 通过将衬垫定位在支撑表面上，通过衬垫的工作表面（22）以与router刨机钻头（24）和至少一个相邻的突出的止动构件（33）相对的间隔关系相反的方式在CMP（12） 到router刨机钻头，钻头的外端部分突出到挡块之外。 当钻头旋转时，钻头和垫之间的相对轴向移动导致钻头的外端部分切割垫中的初始凹陷。 旋转钻头和垫之间的相对横向运动然后形成凹槽，该凹槽横向地远离凹槽延伸并且具有与凹槽基本相同的深度。 钻头和垫之间的不同横向运动用于形成各种凹槽图案，其深度由止挡构件精确控制。 凹槽可以形成在抛光表面和/或抛光垫的后部相对表面中，并且通道可以设置用于将后部凹槽与抛光表面或前部凹槽互连。 抛光表面中的凹槽可以设置有出口，在抛光表面与工件表面接触的同时抛光浆料可以流过出口。

Patent Agency Ranking