SYSTEMS, DEVICES, AND METHODS FOR PRECISION LOCATING AND ASSEMBLY OF ADDITIVELY MANUFACTURED COMPONENTS
    2.
    发明申请
    SYSTEMS, DEVICES, AND METHODS FOR PRECISION LOCATING AND ASSEMBLY OF ADDITIVELY MANUFACTURED COMPONENTS 审中-公开
    用于精确定位和组装附加制造组件的系统,设备和方法

    公开(公告)号:WO2018005693A1

    公开(公告)日:2018-01-04

    申请号:PCT/US2017/039827

    申请日:2017-06-28

    Abstract: Methods, systems, and devices for precision locating additively manufactured components for assembly and/or post processing manufacturing are provided for herein. In some embodiments, at least one component can be additively manufactured to include one or more kinematic features on one or more surfaces of the component. The kinematic feature(s) can be configured to engage complementary kinematic feature(s) formed in a second component so the two components can form an assembly. Alternatively, the kinematic feature(s) can be configured to engage complementary kinematic feature(s) associated with a post-processing machine such that the one or more post-processing actions can be performed on the component after the component is precisely located with respect to the machine by way of the kinematic features of the component and associated with the machine. A variety of systems and methods that utilize kinematic features are also provided.

    Abstract translation: 本文提供了用于组装和/或后处理制造的用于精确定位添加制造的部件的方法,系统和设备。 在一些实施例中,至少一个部件可以被附加地制造成在该部件的一个或多个表面上包括一个或多个运动特征。 运动特征可以被构造成接合在第二部件中形成的互补运动特征,从而两个部件可以形成组件。 可选地,运动特征可以被配置为接合与后处理机器相关联的补充运动特征,使得可以在部件精确定位之后在该部件上执行一个或多个后处理动作 通过部件的运动特性并与机器相关联到机器上。 还提供了各种利用运动特征的系统和方法。

    SHAPING NANOSTRUCTURE ARRAYS
    3.
    发明申请
    SHAPING NANOSTRUCTURE ARRAYS 审中-公开
    形成纳米结构阵列

    公开(公告)号:WO2010120564A8

    公开(公告)日:2011-02-24

    申请号:PCT/US2010029530

    申请日:2010-03-31

    CPC classification number: B82B3/00 B29C70/14 B81C1/00031 B82Y30/00 B82Y40/00

    Abstract: Nanostructured assemblies are manufactured by condensing an evaporated wetting agent onto a nanostructure array formed from a plurality of generally aligned carbon nanotubes or other nanostructures. The condensed wetting agent draws the individual nanostructures together to form various geometries of nanostructured assemblies based on various parameters including process variables and the starting shape and dimensional features of the nanostructure array. Various simple and complex geometries can be achieved in this manner, including geometries that are curved, bent, or twisted. Adjacent nanostructure arrays of the same or different starting geometries can be shaped into compound or interrelating structures. Additional process steps such as plasma etching, coating and others can be used to control the shaping and structural attributes of the nanostructured assemblies. A method of making a molded replica of a shaped nanostructure array is also disclosed.

    Abstract translation: 纳米结构的组件通过将蒸发的润湿剂冷凝到由多个大致排列的碳纳米管或其它纳米结构形成的纳米结构阵列上来制造。 冷凝的润湿剂基于包括工艺变量以及纳米结构阵列的起始形状和尺寸特征的各种参数将单个纳米结构拉制在一起以形成纳米结构组件的各种几何形状。 可以以这种方式实现各种简单和复杂的几何形状,包括弯曲,弯曲或扭曲的几何形状。 相同或不同起始几何的相邻纳米结构阵列可以被成形为复合或相互关联的结构。 可以使用诸如等离子体蚀刻,涂层等的其它工艺步骤来控制纳米结构组件的成型和结构特性。 还公开了制备成形纳米结构阵列的模塑复制品的方法。

    SHAPING NANOSTRUCTURE ARRAYS
    4.
    发明申请
    SHAPING NANOSTRUCTURE ARRAYS 审中-公开
    形成纳米结构阵列

    公开(公告)号:WO2010120564A3

    公开(公告)日:2011-01-13

    申请号:PCT/US2010029530

    申请日:2010-03-31

    CPC classification number: B82B3/00 B29C70/14 B81C1/00031 B82Y30/00 B82Y40/00

    Abstract: A method of making a nanostructured assembly comprising the steps of providing a nanostructure array comprising a plurality of nanostructures and shaping the nanostructure array by providing an evaporated wetting agent to the nanostructure array, condensing the evaporated wetting agent onto the nanostructure array and followed removing the condensed wetting agent from the nanostructure array, and a method of making a replica of a shaped nanostructure array are provided.

    Abstract translation: 一种制备纳米结构组件的方法,包括以下步骤:提供包含多个纳米结构的纳米结构阵列,并通过向纳米结构阵列提供蒸发的润湿剂来成形纳米结构阵列,将蒸发的润湿剂冷凝到纳米结构阵列上, 提供来自纳米结构阵列的润湿剂,以及制备成形纳米结构阵列的复制品的方法。

Patent Agency Ranking