公开(公告)号：KR1020050022764A

公开(公告)日：2005-03-08

申请号：KR1020030060464

申请日：2003-08-27

Applicant: 대한민국(창원대학교)

Inventor： 윤재홍

IPC: C23C14/32

CPC classification number: C23C14/547 ,  B23B2228/10 ,  C23C14/0641 ,  G01N23/207

Abstract: PURPOSE: To understand process of arc ion plating and structure and characteristics of a TiN film according to experimental conditions and evaluate characteristics of coating layer according to change of bias voltage related with thickness of coating to observe characteristic change of TiN deposition film and TiAlN deposition film by changing various variables in an arc ion plating apparatus. CONSTITUTION: The process for manufacturing next generation multilayer coated tools for ultra-high speed cutting is characterized in that a TiAlN coating layer is formed on the surface of SKH9 used in various mechanical parts or cutting tools by arc ion plating, wherein the process comprises the steps of: preparing a circular SKH9 work having diameter of 25 mm and thickness of 5 mm, a high speed tool steel, as a sample; solution treating the sample in four electric furnaces at 580 deg.C for 30 minutes, at 880 deg.C for 3 minutes and at 1,220 deg.C for 2 minutes; quenching the solution treated sample in a salt bath at 530 deg.C; air cooling the sample after holding the sample for 5 minutes so that temperature of an inner part of the sample is equal to that of an outer part of the sample; tempering the air cooled sample twice at 560 deg.C for one hour; grinding the sample to a roughness of emery paper No. 1200 and diamond plate 1 μm; ultrasonic cleaning the sample in acetone for 5 minutes after washing the ground sample using detergent; performing sputter cleaning and arc ion plating on the ultrasonic cleaned sample; and performing coating operation comprising introducing N2 gas in a pressure range of 5x10¬-5 torr to 2x10¬-2 torr, impressing an arc current of 50 A to a Ti target as the cathode, and impressing a bias voltage of -300 V and maintaining pressure to 8.6x10¬-3 torr after generation of arc so that the coating operation is performed for one hour at a substrate temperature of about 180 deg.C, wherein results of study on the TiAlN coating layer according to coating conditions of the present experiment are as follows: (1) droplets formed in a circular shape is observed on the surface of the coating layer, and as bias voltage is increased, the number of droplets is decreased, and size of the droplets is reduced, (2) a composition ratio of Ti to Al on the surface of the coating layer is about 2:1, (3) hardness of the coating layer is Hv 1257, but is a little lower than that of general TiAlN coating layers and (4) thickness of the coating layer is hardly influenced by change of bias voltage and less than thickness(about 5 to 6 μm) of general TiAlN coating layers.

Abstract translation: 目的：根据实验条件了解电弧离子电镀工艺及TiN薄膜的结构和特性，并根据涂层厚度的偏置电压变化评估涂层特性，观察TiN沉积薄膜和TiAlN沉积薄膜的特征变化 通过改变电弧离子镀装置中的各种变量。 构成：用于制造用于超高速切割的下一代多层涂层工具的方法的特征在于，通过电弧离子电镀在用于各种机械部件或切削工具的SKH9的表面上形成TiAlN涂层，其中所述方法包括 步骤：制备直径25mm，厚度5mm的圆形SKH9工件，高速工具钢作为样品; 溶液在580℃下在四个电炉中处理30分钟，在880℃下处理3分钟，在1,220℃处理样品2分钟; 在530℃的盐浴中淬灭溶液处理的样品; 将样品保持5分钟后使样品空气冷却，使得样品的内部部分的温度等于样品的外部部分的温度; 将空气冷却样品在560摄氏度下回火2小时; 将样品研磨至1200号砂纸和金刚石板1μm的粗糙度; 使用洗涤剂洗涤研磨样品后，用丙酮超声清洗样品5分钟; 对超声波清洗样品进行溅射清洗和电弧离子镀; 并执行涂覆操作，包括将5×10 -5乇的压力范围内的N 2气体引入2×10 -2乇，将作为阴极的Ti靶施加50A的电弧电流，并施加-300V的偏置电压， 在电弧产生之后将压力保持在8.6×10 -3 -3乇，使得涂覆操作在约180℃的基板温度下进行1小时，其中根据本发明的涂覆条件对TiAlN涂层进行研究的结果 实验如下：（1）在涂层的表面上观察到形成圆形的液滴，随着偏压增加，液滴的数量减少，液滴的尺寸减小，（2） 涂层表面的Ti与Al的组成比为约2:1，（3）涂层硬度为Hv 1257，但略低于普通TiAlN涂层，（4）厚度为 涂层几乎不受偏置电压a的变化的影响 并且小于一般TiAlN涂层的厚度（约5至6μm）。