Abstract:
The present invention relates to a three-dimensional porous organic-inorganic composite structure and to a method for preparing the same, the composite structure comprising the step of: preparing an organic-inorganic composite photoresist solution including an inorganic substance; forming an organic-inorganic composite photoresist layer including the inorganic substance by coating a substrate with the solution; and forming a three-dimensional porous organic-inorganic composite photoresist pattern by examining a three-dimensional optical interference pattern by using a three-dimensional optical interference lithography on the organic-inorganic composite photoresist layer.