公开(公告)号：KR101430982B1

公开(公告)日：2014-08-20

申请号：KR1020130040580

申请日：2013-04-12

Applicant: 서강대학교산학협력단

Inventor： 문준혁 ,  강다영 ,  김영찬 ,  이선복 ,  유영철 ,  이성호

IPC: G03F7/00 ,  C04B38/00 ,  C04B35/01

CPC classification number: G03F7/70408 ,  G03F7/029 ,  G03F7/2006 ,  G03F7/7045 ,  G03F7/70625 ,  H01L21/0273

Abstract: The present invention relates to a three-dimensional porous organic-inorganic composite structure and to a method for preparing the same, the composite structure comprising the step of: preparing an organic-inorganic composite photoresist solution including an inorganic substance; forming an organic-inorganic composite photoresist layer including the inorganic substance by coating a substrate with the solution; and forming a three-dimensional porous organic-inorganic composite photoresist pattern by examining a three-dimensional optical interference pattern by using a three-dimensional optical interference lithography on the organic-inorganic composite photoresist layer.

Abstract translation: 本发明涉及一种三维多孔有机 - 无机复合结构体及其制备方法，该复合结构体包括以下步骤：制备包含无机物质的有机 - 无机复合光致抗蚀剂溶液; 通过用所述溶液涂布基材来形成包括所述无机物质的有机 - 无机复合光致抗蚀剂层; 以及通过在有机 - 无机复合光致抗蚀剂层上使用三维光学干涉光刻法检查三维光学干涉图案来形成三维多孔有机 - 无机复合光致抗蚀剂图案。