전자빔 레지스트와 그 제조방법 및 이를 이용한 패터닝 방법과 UV 나노임프린트용 몰드 제조방법
    1.
    发明公开
    전자빔 레지스트와 그 제조방법 및 이를 이용한 패터닝 방법과 UV 나노임프린트용 몰드 제조방법 无效
    电子束电阻及其制造方法,用于形成图案和制造模具的方法,用于使用电子束电阻的UV纳米压印

    公开(公告)号:KR1020110001275A

    公开(公告)日:2011-01-06

    申请号:KR1020090058748

    申请日:2009-06-30

    CPC classification number: G03F7/0755 B29C59/022 G03F7/0002 H01J37/3174

    Abstract: PURPOSE: An electron resist, a manufacturing method thereof are provided to simplify a manufacturing process by using an electron beam resist with conductivity and transparency. CONSTITUTION: An electron beam resist includes an HSQ(hydrogen silsesquioxane) and a carbon nanotube. An electron beam resist layer(720) is formed on the patterned target. An electron beam resist pattern(725) is formed on the electron beam resist layer. The target is patterned by using the electron beam resist pattern.

    Abstract translation: 目的:提供电子抗蚀剂及其制造方法,以通过使用具有导电性和透明性的电子束抗蚀剂来简化制造工艺。 构成:电子束抗蚀剂包括HSQ(氢倍半硅氧烷)和碳纳米管。 在图案化靶上形成电子束抗蚀剂层(720)。 电子束抗蚀剂图案(725)形成在电子束抗蚀剂层上。 通过使用电子束抗蚀剂图案对靶进行图案化。

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