公开(公告)号：KR1019980012100A

公开(公告)日：1998-04-30

申请号：KR1019960028713

申请日：1996-07-16

Applicant: 한국과학기술연구원

Inventor： 김태송 ,  정형진 ,  김도경 ,  김윤창

IPC: H01L21/324

公开(公告)号：KR100197157B1

公开(公告)日：1999-06-15

申请号：KR1019960028713

申请日：1996-07-16

Applicant: 한국과학기술연구원

Inventor： 김태송 ,  정형진 ,  김도경 ,  김윤창

IPC: H01L21/324

CPC classification number: C23C14/5806 ,  C30B29/32 ,  C30B31/12 ,  C30B33/00 ,  H01L21/31691 ,  H01L21/324 ,  H01L41/1876 ,  H01L41/316 ,  H05B6/806 ,  H05B2206/046

Abstract: A rapid thermal processing method for a ceramic thin film which is capable of carrying out a uniform heating of a large sized wafer, and of achieving a rapid temperature elevation, and of enhancing a crystallinity of a deposited thin film, wherein a thin film-coated material is disposed on a support to rapidly heat the thin film by the application of microwaves, the temperature is measured with a temperature measuring unit, and the generation of the microwaves is halted at a required temperature.