公开(公告)号：US20220396590A1

公开(公告)日：2022-12-15

申请号：US17775716

申请日：2020-11-16

Applicant: ADEKA CORPORATION

Inventor： Akio SAITO ,  Yutaro AOKI

IPC: C07F5/00 ,  C23C16/34 ,  C23C16/40 ,  C23C16/455

Abstract: Provided is a compound represented by the following general formula (1) or (2): where R1 to R4 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or the like, R5 and R6 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, M1 represents a gallium atom or an indium atom; where R7 to R10 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or the like, R11 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and M2 represents a gallium atom or an indium atom.

公开(公告)号：US20200216479A1

公开(公告)日：2020-07-09

申请号：US16631245

申请日：2018-07-04

Applicant: ADEKA CORPORATION

Inventor： Akio SAITO ,  Tsubasa SHIRATORI ,  Yutaro AOKI

IPC: C07F11/00 ,  C23C16/40 ,  C23C16/455 ,  H01L21/02

Abstract: The present invention provides a tungsten compound represented by the following general formula (1): (in the formula, X represents a halogen atom, R1 to R5 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R6 represents a tertiary butyl group or a tertiary pentyl group, and R7 represents an alkyl group having 1 to 5 carbon atoms. However, when R1 to R5 are all hydrogen atoms and R6 is a tertiary butyl group, and when R1 to R5 are all methyl groups and R6 is a tertiary butyl group, R7 represents an alkyl group having 1 to 3 or 5 carbon atoms).

公开(公告)号：US20240030037A1

公开(公告)日：2024-01-25

申请号：US18023158

申请日：2021-08-23

Applicant: ADEKA CORPORATION

Inventor： Yutaro AOKI ,  Masayuki KIMURA ,  Atsushi YAMASHITA

IPC: H01L21/311

CPC classification number: H01L21/31122

Abstract: Provided is a method of etching a metal oxide film in a laminate including a substrate and the metal oxide film formed on a surface thereof by an atomic layer etching method, the method including: a first step of introducing, into a treatment atmosphere storing the laminate, at least one oxidizable compound selected from the group consisting of: an alcohol compound; an aldehyde compound; and an ester compound; and a second step of introducing an oxidizing gas into the treatment atmosphere after the first step.