公开(公告)号：US20180134739A1

公开(公告)日：2018-05-17

申请号：US15861719

申请日：2018-01-04

Applicant: ADEKA CORPORATION

Inventor： Atsushi SAKURAI ,  Masako HATASE ,  Naoki YAMADA ,  Tsubasa SHIRATORI ,  Akio SAITO ,  Tomoharu YOSHINO

IPC: C07F15/06 ,  C23C16/40 ,  C23C16/18 ,  C07C251/04 ,  C07F15/04 ,  C07F1/08 ,  C07C251/08 ,  C07F7/28

CPC classification number: C07F15/065 ,  C07C251/04 ,  C07C251/08 ,  C07F1/08 ,  C07F7/28 ,  C07F15/045 ,  C23C16/18 ,  C23C16/406 ,  C23C16/408

Abstract: Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R1 represents a methyl group or an ethyl group, R2 represents a hydrogen atom or a methyl group, R3 represents a C1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.

公开(公告)号：US20220396590A1

公开(公告)日：2022-12-15

申请号：US17775716

申请日：2020-11-16

Applicant: ADEKA CORPORATION

Inventor： Akio SAITO ,  Yutaro AOKI

IPC: C07F5/00 ,  C23C16/34 ,  C23C16/40 ,  C23C16/455

Abstract: Provided is a compound represented by the following general formula (1) or (2): where R1 to R4 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or the like, R5 and R6 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, M1 represents a gallium atom or an indium atom; where R7 to R10 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or the like, R11 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and M2 represents a gallium atom or an indium atom.

公开(公告)号：US20200216479A1

公开(公告)日：2020-07-09

申请号：US16631245

申请日：2018-07-04

Applicant: ADEKA CORPORATION

Inventor： Akio SAITO ,  Tsubasa SHIRATORI ,  Yutaro AOKI

IPC: C07F11/00 ,  C23C16/40 ,  C23C16/455 ,  H01L21/02

Abstract: The present invention provides a tungsten compound represented by the following general formula (1): (in the formula, X represents a halogen atom, R1 to R5 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R6 represents a tertiary butyl group or a tertiary pentyl group, and R7 represents an alkyl group having 1 to 5 carbon atoms. However, when R1 to R5 are all hydrogen atoms and R6 is a tertiary butyl group, and when R1 to R5 are all methyl groups and R6 is a tertiary butyl group, R7 represents an alkyl group having 1 to 3 or 5 carbon atoms).