公开(公告)号：US10599047B2

公开(公告)日：2020-03-24

申请号：US15988677

申请日：2018-05-24

Applicant: ASML Netherlands B.V.

Inventor： Janneke Ravensbergen ,  Nitesh Pandey ,  Zili Zhou ,  Armand Eugene Albert Koolen ,  Sebastianus Adrianus Goorden ,  Bastiaan Onne Fagginger Auer ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G01N21/47 ,  G01B11/27

Abstract: A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.

公开(公告)号：US10739687B2

公开(公告)日：2020-08-11

申请号：US16185062

申请日：2018-11-09

Applicant: ASML Netherlands B.V.

Inventor： Hendrik Jan Hidde Smilde ,  Bastiaan Onne Fagginger Auer ,  Davit Harutyunyan ,  Patrick Warnaar

IPC: G03F7/20 ,  G03F9/00 ,  G01B9/04 ,  G01N21/88

Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.

公开(公告)号：US20190243253A1

公开(公告)日：2019-08-08

申请号：US16256359

申请日：2019-01-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Anagnostis TSIATMAS ,  Joannes Jitse Venselaar ,  Samee Ur Rehman ,  Mariya Vyacheslavivna Medvedyeva ,  Bastiaan Onne Fagginger Auer ,  Martijn Maria Zaal ,  Thaleia Kontoroupi

IPC: G03F7/20

CPC classification number: G03F7/70091 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70633 ,  G03F7/70641

Abstract: Methods of optimizing a metrology process are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a first target on a substrate are obtained. Each application of the metrology process includes illuminating the first target with a radiation spot and detecting radiation redirected by the first target. The applications of the metrology process include applications at a) plural positions of the radiation spot relative to the first target, and/or b) plural focus heights of the radiation spot. The measurement data includes, for each application of the metrology process, a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal alignment and/or an optimal focus height based on comparisons between the detected pupil representations in the measurement data and a reference pupil representation.

公开(公告)号：US10162271B2

公开(公告)日：2018-12-25

申请号：US15115229

申请日：2014-12-30

Applicant: ASML Netherlands B.V.

Inventor： Hendrik Jan Hidde Smilde ,  Bastiaan Onne Fagginger Auer ,  Davit Harutyunyan ,  Patrick Warnaar

IPC: G01B11/00 ,  G01B11/04 ,  G03B27/32 ,  G03B27/74 ,  G03F7/20 ,  G03F9/00 ,  G01B9/04 ,  G01N21/88

Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.

公开(公告)号：US11556060B2

公开(公告)日：2023-01-17

申请号：US16556637

申请日：2019-08-30

Applicant: ASML Netherlands B.V.

Inventor： Seyed Iman Mossavat ,  Bastiaan Onne Fagginger Auer ,  Remco Dirks ,  Alexandru Onose ,  Hugo Augustinus Joseph Cramer

IPC: G03F7/20 ,  G05B13/02 ,  H01L21/66

Abstract: Methods for calibrating metrology apparatuses and determining a parameter of interest are disclosed. In one arrangement, training data is provided that comprises detected representations of scattered radiation detected by each of plural metrology apparatuses. An encoder encodes each detected representation to provide an encoded representation, and a decoder generates a synthetic detected representation from the respective encoded representation. A classifier estimates from which metrology apparatus originates each encoded representation or each synthetic detected representation. The training data is used to simultaneously perform, in an adversarial relationship relative to each other, a first machine learning process involving the encoder or decoder and a second machine learning process involving the classifier.

公开(公告)号：US10983445B2

公开(公告)日：2021-04-20

申请号：US16268564

申请日：2019-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh Pandey ,  Zili Zhou ,  Gerbrand Van Der Zouw ,  Arie Jeffrey Den Boef ,  Markus Gerardus Martinus Maria Van Kraaij ,  Armand Eugene Albert Koolen ,  Hugo Augustinus Joseph Cramer ,  Paul Christiaan Hinnen ,  Martinus Hubertus Maria Van Weert ,  Anagnostis Tsiatmas ,  Shu-jin Wang ,  Bastiaan Onne Fagginger Auer ,  Alok Verma

IPC: G03F7/20 ,  G01N21/21 ,  G01N21/88

Abstract: An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.

公开(公告)号：US10585354B2

公开(公告)日：2020-03-10

申请号：US16256359

申请日：2019-01-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Anagnostis Tsiatmas ,  Joannes Jitse Venselaar ,  Samee Ur Rehman ,  Mariya Vyacheslavivna Medvedyeva ,  Bastiaan Onne Fagginger Auer ,  Martijn Maria Zaal ,  Thaleia Kontoroupi

IPC: G03F7/20

Abstract: Methods of optimizing a metrology process are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a first target on a substrate are obtained. Each application of the metrology process includes illuminating the first target with a radiation spot and detecting radiation redirected by the first target. The applications of the metrology process include applications at a) plural positions of the radiation spot relative to the first target, and/or b) plural focus heights of the radiation spot. The measurement data includes, for each application of the metrology process, a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal alignment and/or an optimal focus height based on comparisons between the detected pupil representations in the measurement data and a reference pupil representation.

公开(公告)号：US10571363B2

公开(公告)日：2020-02-25

申请号：US16253338

申请日：2019-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Mariya Vyacheslavivna Medvedyeva ,  Anagnostis Tsiatmas ,  Hugo Augustinus Joseph Cramer ,  Martinus Hubertus Maria Van Weert ,  Bastiaan Onne Fagginger Auer ,  Xiaoxin Shang ,  Johan Maria Van Boxmeer ,  Bert Verstraeten

IPC: G01M11/02 ,  G03F7/20 ,  G02B7/38

Abstract: Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.

公开(公告)号：US20180348645A1

公开(公告)日：2018-12-06

申请号：US15988677

申请日：2018-05-24

Applicant: ASML Netherlands B.V.

Inventor： Janneke Ravensbergen ,  Nitesh Pandey ,  Zili Zhou ,  Armand Eugene Albert Koolen ,  Sebastianus Adrianus Goorden ,  Bastiaan Onne Fagginger Auer ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F7/20 ,  G01B11/27

CPC classification number: G03F7/7055 ,  G01B11/272 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95623 ,  G03F7/70625 ,  G03F7/70633

Abstract: A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.

公开(公告)号：US20180129140A1

公开(公告)日：2018-05-10

申请号：US15796298

申请日：2017-10-27

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph CRAMER ,  Bastiaan Onne Fagginger Auer

IPC: G03F7/20 ,  G01N21/47

CPC classification number: G03F7/70625 ,  G01N21/47 ,  G03F7/705 ,  G03F7/70616 ,  G03F7/7085

Abstract: Disclosed is a method of measuring a parameter of interest relating to a structure on a substrate, and associated metrology apparatus. The method comprises determining a correction to compensate for the effect of a measurement condition on a measurement signal from a plurality of measurement signals, wherein each of said measurement signals results from a different measurement of the structure performed under a different variation of said measurement condition. The correction is then used in a reconstruction of a mathematical model of said structure to suppress an influence of variations of said measurement condition on the reconstruction.