公开(公告)号：US20230314930A1

公开(公告)日：2023-10-05

申请号：US18022476

申请日：2021-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich BANINE ,  Paul Alexander VERMEULEN ,  Cornelis Adrianus DE MEIJERE ,  Johnnes Hubertus Josephina MOORS ,  Andrey NIKIPELOV ,  Guido SALMASO ,  Marcus Adrianus VAN DE KERKHOF ,  Parham YAGHOOBI

IPC: G03F1/64 ,  G03F7/20

CPC classification number: G03F1/64 ,  G03F7/70983

Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly, the apparatus including: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.

公开(公告)号：US20210240070A1

公开(公告)日：2021-08-05

申请号：US17048875

申请日：2019-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Dennis DE GRAAF ,  Richard BEAUDRY ,  Maxime BIRON ,  Paul JANSSEN ,  Thijs KATER ,  Kevin KORNELSEN ,  Michael Alfred Josephus KUIJKEN ,  Jan Hendrik Willem KUNTZEL ,  Stephane MARTEL ,  Maxim Aleksandrovich NASALEVICH ,  Guido SALMASO ,  Pieter-Jan VAN ZWOL

IPC: G03F1/64 ,  G03F7/20 ,  H01L21/033 ,  H01L21/027

Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.

公开(公告)号：US20240337956A1

公开(公告)日：2024-10-10

申请号：US18578780

申请日：2022-07-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Lucas Christiaan Johan HEIJMANS ,  Imre Rudolf Richard DEHNER ,  Raymond Wilhelmus Louis LAFARRE ,  Cornelis Christiaan OTTENS ,  Marcus Adrianus VAN DE KERKHOF ,  Andrey NIKIPELOV ,  Dennis VANOTTERDIJK ,  Edwin Johannes Theodorus SMULDERS ,  Andrei Mikhailovich YAKUNIN ,  Guido SALMASO ,  Luc VOORDECKERS ,  Chaitanya Krishna ANDE ,  Martinus Jacobus Johannes COENEN

IPC: G03F7/00 ,  G03F1/62

CPC classification number: G03F7/70925 ,  G03F7/70708 ,  G03F7/7085 ,  G03F7/70875 ,  G03F1/62

Abstract: An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus including at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules include a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms include: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.

公开(公告)号：US20240302736A1

公开(公告)日：2024-09-12

申请号：US18618406

申请日：2024-03-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Dennis DE GRAAF ,  Richard BEAUDRY ,  Maxime BIRON ,  Paul JANSSEN ,  Thijs KATER ,  Kevin KORNELSEN ,  Michael Alfred Josephus KUIJKEN ,  Jan Hendrik Willem KUNTZEL ,  Stephane MARTEL ,  Maxim Aleksandrovich NASALEVICH ,  Guido SALMASO ,  Pieter-Jan VAN ZWOL

IPC: G03F1/64 ,  G03F1/62 ,  G03F7/00

CPC classification number: G03F1/64 ,  G03F1/62 ,  G03F7/70983

Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidizing environment. In any aspect, the pellicle may include a metal nitride layer.