公开(公告)号：US20220121110A1

公开(公告)日：2022-04-21

申请号：US17566764

申请日：2021-12-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester HOUWELING ,  Chaitanya Krishna ANDE ,  Dennis DE GRAAF ,  Thijs KATER ,  Michael Alfred Josephus KUIJKEN ,  Mahdiar VALEFI

IPC: G03F1/62

Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：US20250004362A1

公开(公告)日：2025-01-02

申请号：US18293851

申请日：2022-07-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Franciscus Theodorus AGRICOLA ,  Lourdes FERRE LLIN ,  Dennis DE GRAAF ,  Chaitanya Krishna ANDE ,  Inci DONMEZ NOYAN ,  Fai Tong SI ,  Ties Wouter VAN DER WOORD ,  Anne-Sophie ROLLIER ,  Maxime BIRON ,  Adrianus Johannes Maria GIESBERS

IPC: G03F1/62 ,  G03F1/24

Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane includes metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.

公开(公告)号：US20220121111A1

公开(公告)日：2022-04-21

申请号：US17548944

申请日：2021-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Mária PÉTER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20200341365A1

公开(公告)日：2020-10-29

申请号：US16758250

申请日：2018-11-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester HOUWELING ,  Chaitanya Krishna ANDE ,  Dennis DE GRAAF ,  Thijs KATER ,  Michael Alfred Josephus KUIJKEN ,  Mahdiar VALEFI

IPC: G03F1/64 ,  G03F1/00

Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：US20200209736A1

公开(公告)日：2020-07-02

申请号：US16614815

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Flendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Maria PETER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64 ,  G03F7/20

Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20240337956A1

公开(公告)日：2024-10-10

申请号：US18578780

申请日：2022-07-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Lucas Christiaan Johan HEIJMANS ,  Imre Rudolf Richard DEHNER ,  Raymond Wilhelmus Louis LAFARRE ,  Cornelis Christiaan OTTENS ,  Marcus Adrianus VAN DE KERKHOF ,  Andrey NIKIPELOV ,  Dennis VANOTTERDIJK ,  Edwin Johannes Theodorus SMULDERS ,  Andrei Mikhailovich YAKUNIN ,  Guido SALMASO ,  Luc VOORDECKERS ,  Chaitanya Krishna ANDE ,  Martinus Jacobus Johannes COENEN

IPC: G03F7/00 ,  G03F1/62

CPC classification number: G03F7/70925 ,  G03F7/70708 ,  G03F7/7085 ,  G03F7/70875 ,  G03F1/62

Abstract: An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus including at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules include a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms include: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.

公开(公告)号：US20240027893A1

公开(公告)日：2024-01-25

申请号：US18220799

申请日：2023-07-11

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Mária PÉTER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.