公开(公告)号：US20230152717A1

公开(公告)日：2023-05-18

申请号：US17915087

申请日：2021-03-24

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie BAGGEN ,  Jasper Hendrik GRASMAN ,  Chin-Fa TU ,  Lucas KUINDERSMA

IPC: G03F7/20

CPC classification number: G03F7/70833 ,  G03F7/7085 ,  G03F7/70975

Abstract: An interface plate for mounting an apparatus or an assembly of an apparatus to a floor or floor plate is described, the interface plate comprising: an install block having an install surface configured to receive an interface surface of the apparatus or assembly; an adjustment mechanism configured to adjust a position or orientation of the install block relative to the floor or floor plate; and a mounting mechanism configured to rigidly mount the install block to the floor or floor plate.

公开(公告)号：US20230114067A1

公开(公告)日：2023-04-13

申请号：US17798061

申请日：2021-02-04

Applicant: ASML Netherlands B.V.

Inventor： Long DI ,  Chenxi FU ,  Lucas KUINDERSMA ,  Kuo-Feng TSENG ,  Peter Paul HEMPENIUS ,  Yu LIU ,  Ying LUO

IPC: H01J41/12 ,  H01J37/28

Abstract: Apparatuses and systems for damping vibration of a vacuum vessel mounted with a pump include a pump body and a damping element coupled to the pump body, wherein the pump body and the damping element form a mass-based damper, and wherein the pump body forms a mass component of the mass-based damper; and the damping element forms a damping component of the mass-based damper. The apparatuses and systems also include a pump body configured to be secured to a column of a charged-particle inspection apparatus, a sensor coupled to the pump body, an actuator coupled to the pump body, and a circuitry communicatively coupled to the sensor and the actuator for receiving motion data indicative of a vibration of the column; determining a damping based on the motion data; and actuate the actuator to react to the vibration of the column in accordance with the damping.

公开(公告)号：US20190129317A1

公开(公告)日：2019-05-02

申请号：US16219449

申请日：2018-12-13

Applicant: ASML Netherlands B.V.

Inventor： Michael RONDE ,  Lucas KUINDERSMA ,  Niels BOSCH ,  Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  Marc Wilhelmus Maria VAN DER WIJST ,  Thijs VERHEES ,  Sander KERSSEMAKERS

IPC: G03F7/20

Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.

公开(公告)号：US20230205101A1

公开(公告)日：2023-06-29

申请号：US17927348

申请日：2021-05-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Luuc KEULEN ,  Jeroen Gerard GOSEN ,  Dennis Herman Caspar VAN BANNING ,  Sampann ARORA ,  Michaél Johannes Christiaan RONDE ,  Lucas KUINDERSMA ,  Youssef Karel Maria DE VOS ,  Henricus Martinus Johannes VAN DE GROES ,  Allard Eelco KOOIKER ,  Wouter Onno PRIL ,  Johan VAN GEND

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70883 ,  G03F7/70725

Abstract: An apparatus for use in a metrology process or a lithographic process, the apparatus including: an object support module adapted to hold an object; and a first gas shower arranged on a first side of the object support module and adapted to emit a gas with a first velocity in a first gas direction which is a horizontal direction to cause a net gas flow in the apparatus to be a substantially horizontal gas flow in the first gas direction at least above the object support module.

公开(公告)号：US20220199358A1

公开(公告)日：2022-06-23

申请号：US17601697

申请日：2020-03-25

Applicant: ASML Netherlands B.V.

Inventor： Maikel Robert GOOSEN ,  Albertus Victor Gerardus MANGNUS ,  Lucas KUINDERSMA

IPC: H01J37/22 ,  H01J37/28 ,  G06T7/00

Abstract: Embodiments consistent with the disclosure herein include methods for image enhancement for a multi-beam charged-particle inspection system. Systems and methods consistent with the present disclosure include analyzing signal information representative of first and second images, wherein the first image is associated with a first beam of a set of beams and the second image is associated with a second beam of the set of beams; detecting, based on the analysis, disturbances in positioning of the first and second beams in relation to a sample; obtaining an image of the sample using the signal information of the first and second beams; and correcting the image of the sample using the identified disturbances.