公开(公告)号：US20230205101A1

公开(公告)日：2023-06-29

申请号：US17927348

申请日：2021-05-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Luuc KEULEN ,  Jeroen Gerard GOSEN ,  Dennis Herman Caspar VAN BANNING ,  Sampann ARORA ,  Michaél Johannes Christiaan RONDE ,  Lucas KUINDERSMA ,  Youssef Karel Maria DE VOS ,  Henricus Martinus Johannes VAN DE GROES ,  Allard Eelco KOOIKER ,  Wouter Onno PRIL ,  Johan VAN GEND

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70883 ,  G03F7/70725

Abstract: An apparatus for use in a metrology process or a lithographic process, the apparatus including: an object support module adapted to hold an object; and a first gas shower arranged on a first side of the object support module and adapted to emit a gas with a first velocity in a first gas direction which is a horizontal direction to cause a net gas flow in the apparatus to be a substantially horizontal gas flow in the first gas direction at least above the object support module.

公开(公告)号：US20170343390A1

公开(公告)日：2017-11-30

申请号：US15524263

申请日：2015-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Wouter Onno PRIL ,  Jan Peter BAARTMAN ,  Allard Eelco KOOIKER ,  Suzanne Johanna, Antonetta, COSIJNS ,  Bryan TONG-MINH

IPC: G01D5/38 ,  G01B9/02 ,  G01B11/02 ,  G03F7/20

Abstract: An encoder includes an optical component and an enclosing device having a first surface portion and a second surface portion. The first surface portion is arranged to receive from an ambient environment a first radiation beam. The second surface portion is arranged to receive from the ambient environment a second radiation beam. The optical component is arranged to combine the first and second radiation beams. The enclosing device is arranged to propagate the first radiation beam along a first path. The first path is between the first surface portion and the optical component. The enclosing device is arranged to propagate the second radiation beam along a second path. The second path is between the second surface portion and the optical component. The enclosing device is arranged to enclose a space, so as to isolate the first path and the second path from the ambient environment.

公开(公告)号：US20250132122A1

公开(公告)日：2025-04-24

申请号：US18990157

申请日：2024-12-20

Applicant: ASML Netherlands B.V.

Inventor： Thomas Izaak Fred HAARTSEN ,  Niels Johannes Maria BOSCH ,  Jasper Hendrik GRASMAN ,  Martin Frans Pierre SMEETS ,  Erwin SLOT ,  Wouter Onno PRIL ,  Peter Paul HEMPENIUS ,  Te-Yu CHEN

IPC: H01J37/21 ,  G01B7/02 ,  H01J37/20

Abstract: The present disclosure relates to apparatus and methods for assessing samples using a plurality of charged particle beams. In one arrangement, at least a subset of a beam grid of a plurality of charged particle beams and respective target portions of a sample surface are scanned relative to each other to process the target portions. Signal charged particles from the sample are detected to generate detection signals. A sample surface topographical map is generated that represents a topography of the sample surface by analyzing the detection signals.

公开(公告)号：US20200234911A1

公开(公告)日：2020-07-23

申请号：US16840297

申请日：2020-04-03

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie BAGGEN ,  Wouter Onno PRIL ,  Engelbertus Antonius Fransiscus VAN DER PASCH

IPC: H01J37/20 ,  H01J37/317 ,  H01J37/244

Abstract: A stage apparatus for an e-beam inspection apparatus comprising: an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; a positioning device (180) configured to a position the object table; a position measurement system (5) comprising a position sensor (8-10) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (9, 10, 22), wherein a measurement beam (11, 15) of the interferometer sensor is configured to irradiate a reflective surface (13, 17) of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.