公开(公告)号：US12234338B2

公开(公告)日：2025-02-25

申请号：US16311888

申请日：2017-06-21

Applicant: BASF SE

Inventor： Uwe Keppeler ,  Juergen Bartl ,  Juergen Ahlers ,  Christian Daeschlein ,  Peter Gutmann ,  Frank Prissok

IPC: C08J9/18 ,  B29C44/34 ,  B29K77/00 ,  B29K101/12 ,  C08G69/40 ,  C08J9/12 ,  C08J9/14 ,  C08J9/232

Abstract: A process for producing foam particles composed of thermoplastic elastomers having polyamide segments, comprising the steps: (a) production of a suspension of pellets of the thermoplastic elastomer in a suspension medium, (b) addition of a blowing agent, (c) impregnation of the pellets with the blowing agent by heating of the suspension in a pressure vessel to an impregnation temperature IMT at an impregnation pressure IMP, depressurization of the suspension by emptying of the pressure vessel via a depressurization device and work-up of the foam particles obtained, and also foam particles obtainable by the process.

公开(公告)号：US11993729B2

公开(公告)日：2024-05-28

申请号：US16765665

申请日：2018-11-12

Applicant: BASF SE

Inventor： Christian Daeschlein ,  Max Siebert ,  Yongqing Lan ,  Michael Lauter ,  Sheik Ansar Usman Ibrahim ,  Reza M Golzarian ,  Te Yu Wei ,  Haci Osman Guevenc ,  Julian Proelss ,  Leonardus Leunissen

IPC: C09G1/02 ,  H01L21/321

CPC classification number: C09G1/02 ,  H01L21/3212

Abstract: The presently claimed subject matter is directed to a chemical mechanical polishing (CMP) composition comprising inorganic particles, at least one organic compound comprising an amino group and/or at least one acid group (Y), potassium persulfate, at least one corrosion inhibitor and an aqueous medium for polishing substrates of the semiconductor industry comprising cobalt and/or a cobalt alloy and TiN and/or TaN.