中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

43 records (took 0.031 seconds)

    2.
    发明专利
    未知

    公开(公告)号：AT555421T

    公开(公告)日：2012-05-15

    申请号：AT02007216

    申请日：2002-03-27

    Applicant: FUJIFILM CORP

    Inventor： KUNITA KAZUTO

    IPC: G03F7/027 ,  B41C1/10 ,  B41M5/36 ,  C08F20/00 ,  C08F24/00 ,  C08F26/00 ,  C08F28/00 ,  C08F30/00 ,  G03F7/00 ,  G03F7/021 ,  G03F7/033 ,  G03F7/038

    Abstract: The photosensitive composition comprises a resin containing monomer repeating unit. The photosensitive composition comprises a resin containing monomer repeating unit represented by formula (I). [Image] Q 1>cyano or COX 2>; X 1>, X 2>halogen or group connected through hetero atom; and Ra, Rb : H, halogen, cyano or organic residue, or X 1>and X 2>, Ra and Rb or X 1>and Ra or Rb may combine with each other to form a cyclic structure. An independent claim is included for negative working lithographic printing plate which has a negative working photosensitive layer comprising the photosensitive composition.

    3.
    发明专利
    未知

    公开(公告)号：AT544095T

    公开(公告)日：2012-02-15

    申请号：AT02019103

    申请日：2002-08-29

    Applicant: FUJIFILM CORP

    Inventor： KUNITA KAZUTO

    IPC: G03F7/027 ,  B41C1/10 ,  G03F7/32

    Abstract: A plate-making method of a printing plate comprising exposing a printing plate precursor having a photosensitive layer comprising a photopolymerizable composition containing (i) a crosslinking agent having two ethylenic polymerizable groups and (ii) a crosslinking agent having three or more ethylenic polymerizable groups, and development processing the exposed printing plate precursor with an alkali developer having a pH of not more than 12.5.

    4.
    发明专利
    未知

    公开(公告)号：DE602005005741T2

    公开(公告)日：2009-04-16

    申请号：DE602005005741

    申请日：2005-06-24

    Applicant: FUJIFILM CORP

    Inventor： KUNITA KAZUTO

    IPC: B41C1/10 ,  B41J2/01 ,  B41M5/00 ,  C09D11/037 ,  C09D11/10 ,  C09D11/101 ,  C09D11/103 ,  C09D11/106 ,  C09D11/108 ,  C09D11/322 ,  C09D11/328 ,  G03F7/027

    Abstract: An ink composition for inkjet recording, capable of being cured upon radiation exposure, is provided and contains: a coloring material; and a polymerizing compound. The polymerizing compound is a specific ±-heteromethacryl compound. A method of producing lithographic printing plate is also provided and includes:ejecting an ink composition for inkjet recording onto a hydrophilic substrate, the ink composition containing a coloring material and a polymerizing compound; and irradiating the ink composition on the hydrophilic substrate to cure the ink composition, so as to form an image.

    5.
    发明专利
    未知

    公开(公告)号：DE60037951T2

    公开(公告)日：2009-02-05

    申请号：DE60037951

    申请日：2000-05-19

    Applicant: FUJIFILM CORP

    Inventor： NAKAMURA TATSUO ,  KUNITA KAZUTO ,  KITATANI KATSUJI

    IPC: B41C1/10

    Abstract: The present invention provides a photosensitive composition for an infrared laser used for direct plate making, which has high sensitivity and good developing latitude and storage stability, and provides a planographic printing plate in which this composition is used. The positive-type photosensitive composition of the present invention has a macromolecular compound having acidic groups and an infrared absorbent expressed by the following General Formula 2, wherein alkali aqueous solution solubility is suppressed prior to infrared irradiation, but [said photosensitive composition] becomes soluble in an alkali aqueous solution upon infrared irradiation. In General Formula 2, X and Y are each an oxygen atom, sulfur atom, selenium atom, or tellurium atom. M is a methine chain with at least five conjugated carbons. Rx1 to Rx4 and Ry1 to Ry4 may be the same or different and are each a hydrogen atom, halogen atom, cyano group, alkyl group, aryl group, alkenyl group, alkynyl group, carbonyl group, thio group, sulfonyl group, sulfinyl group, oxy group, or amino group. W- is an anion.

    6.
    发明专利
    未知

    公开(公告)号：DE602005001884T2

    公开(公告)日：2008-04-30

    申请号：DE602005001884

    申请日：2005-04-18

    Applicant: FUJIFILM CORP

    Inventor： KAKINO RYUKI ,  KUNITA KAZUTO ,  OSHIMA YASUHITO

    IPC: B41M5/36 ,  G03F7/004 ,  B41C1/10 ,  B41N1/14 ,  G03F7/00

    Abstract: A lithographic printing plate precursor comprises: a support; and a photosensitive-thermosensitive layer that allows image recording by exposure to an infrared laser light, wherein the photosensitive-thermosensitive layer comprises (1) an infrared absorbent and (2) a compound which undergoes color change upon oxidation or reduction.

    7.
    发明专利
    未知

    公开(公告)号：AT385463T

    公开(公告)日：2008-02-15

    申请号：AT00110254

    申请日：2000-05-19

    Applicant: FUJIFILM CORP

    Inventor： NAKAMURA TATSUO ,  KUNITA KAZUTO ,  KITATANI KATSUJI

    IPC: B41C1/10

    Abstract: The present invention provides a photosensitive composition for an infrared laser used for direct plate making, which has high sensitivity and good developing latitude and storage stability, and provides a planographic printing plate in which this composition is used. The positive-type photosensitive composition of the present invention has a macromolecular compound having acidic groups and an infrared absorbent expressed by the following General Formula 2, wherein alkali aqueous solution solubility is suppressed prior to infrared irradiation, but [said photosensitive composition] becomes soluble in an alkali aqueous solution upon infrared irradiation. In General Formula 2, X and Y are each an oxygen atom, sulfur atom, selenium atom, or tellurium atom. M is a methine chain with at least five conjugated carbons. Rx1 to Rx4 and Ry1 to Ry4 may be the same or different and are each a hydrogen atom, halogen atom, cyano group, alkyl group, aryl group, alkenyl group, alkynyl group, carbonyl group, thio group, sulfonyl group, sulfinyl group, oxy group, or amino group. W- is an anion.

Patent Agency Ranking