公开(公告)号：DE60037951T2

公开(公告)日：2009-02-05

申请号：DE60037951

申请日：2000-05-19

Applicant: FUJIFILM CORP

Inventor： NAKAMURA TATSUO ,  KUNITA KAZUTO ,  KITATANI KATSUJI

IPC: B41C1/10

Abstract: The present invention provides a photosensitive composition for an infrared laser used for direct plate making, which has high sensitivity and good developing latitude and storage stability, and provides a planographic printing plate in which this composition is used. The positive-type photosensitive composition of the present invention has a macromolecular compound having acidic groups and an infrared absorbent expressed by the following General Formula 2, wherein alkali aqueous solution solubility is suppressed prior to infrared irradiation, but [said photosensitive composition] becomes soluble in an alkali aqueous solution upon infrared irradiation. In General Formula 2, X and Y are each an oxygen atom, sulfur atom, selenium atom, or tellurium atom. M is a methine chain with at least five conjugated carbons. Rx1 to Rx4 and Ry1 to Ry4 may be the same or different and are each a hydrogen atom, halogen atom, cyano group, alkyl group, aryl group, alkenyl group, alkynyl group, carbonyl group, thio group, sulfonyl group, sulfinyl group, oxy group, or amino group. W- is an anion.

公开(公告)号：AT385463T

公开(公告)日：2008-02-15

申请号：AT00110254

申请日：2000-05-19

Applicant: FUJIFILM CORP

Inventor： NAKAMURA TATSUO ,  KUNITA KAZUTO ,  KITATANI KATSUJI

IPC: B41C1/10

Abstract: The present invention provides a photosensitive composition for an infrared laser used for direct plate making, which has high sensitivity and good developing latitude and storage stability, and provides a planographic printing plate in which this composition is used. The positive-type photosensitive composition of the present invention has a macromolecular compound having acidic groups and an infrared absorbent expressed by the following General Formula 2, wherein alkali aqueous solution solubility is suppressed prior to infrared irradiation, but [said photosensitive composition] becomes soluble in an alkali aqueous solution upon infrared irradiation. In General Formula 2, X and Y are each an oxygen atom, sulfur atom, selenium atom, or tellurium atom. M is a methine chain with at least five conjugated carbons. Rx1 to Rx4 and Ry1 to Ry4 may be the same or different and are each a hydrogen atom, halogen atom, cyano group, alkyl group, aryl group, alkenyl group, alkynyl group, carbonyl group, thio group, sulfonyl group, sulfinyl group, oxy group, or amino group. W- is an anion.

公开(公告)号：DE60042764D1

公开(公告)日：2009-09-24

申请号：DE60042764

申请日：2000-05-19

Applicant: FUJIFILM CORP

Inventor： KUNITA KAZUTO ,  KITATANI KATSUJI ,  NAKAMURA TATSUO

IPC: B41C1/10

Abstract: The present invention provides a photosensitive composition for an infrared laser used for direct plate making, which has high sensitivity and good developing latitude and storage stability, and provides a planographic printing plate in which this composition is used. The positive-type photosensitive composition of the present invention has a macromolecular compound having acidic groups and an infrared absorbent expressed by the following General Formula 2, wherein alkali aqueous solution solubility is suppressed prior to infrared irradiation, but [said photosensitive composition] becomes soluble in an alkali aqueous solution upon infrared irradiation. In General Formula 2, X and Y are each an oxygen atom, sulfur atom, selenium atom, or tellurium atom. M is a methine chain with at least five conjugated carbons. Rx1 to Rx4 and Ry1 to Ry4 may be the same or different and are each a hydrogen atom, halogen atom, cyano group, alkyl group, aryl group, alkenyl group, alkynyl group, carbonyl group, thio group, sulfonyl group, sulfinyl group, oxy group, or amino group. W- is an anion.

公开(公告)号：AT439235T

公开(公告)日：2009-08-15

申请号：AT07020069

申请日：2000-05-19

Applicant: FUJIFILM CORP

Inventor： KUNITA KAZUTO ,  KITATANI KATSUJI ,  NAKAMURA TATSUO

IPC: B41C1/10

Abstract: The present invention provides a photosensitive composition for an infrared laser used for direct plate making, which has high sensitivity and good developing latitude and storage stability, and provides a planographic printing plate in which this composition is used. The positive-type photosensitive composition of the present invention has a macromolecular compound having acidic groups and an infrared absorbent expressed by the following General Formula 2, wherein alkali aqueous solution solubility is suppressed prior to infrared irradiation, but [said photosensitive composition] becomes soluble in an alkali aqueous solution upon infrared irradiation. In General Formula 2, X and Y are each an oxygen atom, sulfur atom, selenium atom, or tellurium atom. M is a methine chain with at least five conjugated carbons. Rx1 to Rx4 and Ry1 to Ry4 may be the same or different and are each a hydrogen atom, halogen atom, cyano group, alkyl group, aryl group, alkenyl group, alkynyl group, carbonyl group, thio group, sulfonyl group, sulfinyl group, oxy group, or amino group. W- is an anion.

公开(公告)号：DE60037951D1

公开(公告)日：2008-03-20

申请号：DE60037951

申请日：2000-05-19

Applicant: FUJIFILM CORP

Inventor： NAKAMURA TATSUO ,  KUNITA KAZUTO ,  KITATANI KATSUJI

IPC: B41C1/10

Abstract: The present invention provides a photosensitive composition for an infrared laser used for direct plate making, which has high sensitivity and good developing latitude and storage stability, and provides a planographic printing plate in which this composition is used. The positive-type photosensitive composition of the present invention has a macromolecular compound having acidic groups and an infrared absorbent expressed by the following General Formula 2, wherein alkali aqueous solution solubility is suppressed prior to infrared irradiation, but [said photosensitive composition] becomes soluble in an alkali aqueous solution upon infrared irradiation. In General Formula 2, X and Y are each an oxygen atom, sulfur atom, selenium atom, or tellurium atom. M is a methine chain with at least five conjugated carbons. Rx1 to Rx4 and Ry1 to Ry4 may be the same or different and are each a hydrogen atom, halogen atom, cyano group, alkyl group, aryl group, alkenyl group, alkynyl group, carbonyl group, thio group, sulfonyl group, sulfinyl group, oxy group, or amino group. W- is an anion.