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1.发明申请
公开(公告)号：WO2020192852A1
公开(公告)日：2020-10-01
申请号：PCT/DK2019/050103
申请日：2019-03-25
Applicant: GEA PROCESS ENGINEERING A/S
Abstract: A spray drying apparatus has a spray drying chamber; a liquid feed atomizer; a drying gas disperser; a perforated bottom; and a plenum chamber (31) with an outlet (33) below the perforated bottom. At least one guide plate (40a, 40b, 40c) is provided in the plenum chamber (31) to direct gas, which is passing through the perforated bottom into the plenum chamber (31), towards the bottom (32) of the plenum chamber (31). The guide plates (40a, 40b, 40c) have lower edges extending on average down to at least half-way between the perforated bottom of the spray drying chamber and the bottom (32) of the plenum chamber (31).
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公开(公告)号：WO2020001713A1
公开(公告)日：2020-01-02
申请号：PCT/DK2018/050175
申请日：2018-06-29
Applicant: GEA PROCESS ENGINEERING A/S
Inventor： STEFFENSEN, Mads Lund , INGVORSEN, Kristian Mark , DHANOA, Jasbir
Abstract: In the gas disperser (3), a flow conditioning device (5, 6) is located in the inlet duct section (32). The flow conditioning device comprises a hole plate (5) and a flow straightener (6) positioned in parallel with and at a distance (h) in the axial direction (axd) from the downstream side of the hole plate (5). The hole plate (5) has a predefined hole plate thickness (tp) in the axial direction (axd) and each flow straightener (6) has a predefined flow straightener length (Is) in the axial direction (axd), the flow straightener length (Is) being substantially larger than the hole plate thickness (tp).
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3.发明公开
公开(公告)号：EP3948126A1
公开(公告)日：2022-02-09
申请号：EP19715808.2
申请日：2019-03-25
Applicant: GEA Process Engineering A/S
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公开(公告)号：EP3813967A1
公开(公告)日：2021-05-05
申请号：EP18742920.4
申请日：2018-06-29
Applicant: GEA Process Engineering A/S
Inventor： STEFFENSEN, Mads Lund , INGVORSEN, Kristian Mark , DHANOA, Jasbir
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