Patent search ap:("GEA Process Engineering A/S") AND inv:"DHANOA Page Jasbir"

1.

发明申请
GAS DISPERSER FOR GUIDING GAS INTO A CHAMBER, SPRAY DRYING APPARATUS COMPRISING SUCH A GAS DISPERSER, AND METHOD OF ALIGNING A STREAM OF GAS IN A GAS DISPERSER 审中-公开

公开(公告)号：WO2020001713A1

公开(公告)日：2020-01-02

申请号：PCT/DK2018/050175

申请日：2018-06-29

Applicant: GEA PROCESS ENGINEERING A/S

Inventor： STEFFENSEN, Mads Lund , INGVORSEN, Kristian Mark , DHANOA, Jasbir

IPC: B01D1/18 , B01J13/04 , F15D1/00 , F26B3/12 , F26B21/00

Abstract: In the gas disperser (3), a flow conditioning device (5, 6) is located in the inlet duct section (32). The flow conditioning device comprises a hole plate (5) and a flow straightener (6) positioned in parallel with and at a distance (h) in the axial direction (axd) from the downstream side of the hole plate (5). The hole plate (5) has a predefined hole plate thickness (tp) in the axial direction (axd) and each flow straightener (6) has a predefined flow straightener length (Is) in the axial direction (axd), the flow straightener length (Is) being substantially larger than the hole plate thickness (tp).

2.

发明公开
GAS DISPERSER FOR GUIDING GAS INTO A CHAMBER, SPRAY DRYING APPARATUS COMPRISING SUCH A GAS DISPERSER, AND METHOD OF ALIGNING A STREAM OF GAS IN A GAS DISPERSER 审中-公开

公开(公告)号：EP3813967A1

公开(公告)日：2021-05-05

申请号：EP18742920.4

申请日：2018-06-29

Applicant: GEA Process Engineering A/S

Inventor： STEFFENSEN, Mads Lund , INGVORSEN, Kristian Mark , DHANOA, Jasbir

IPC: B01D1/18 , B01J13/04 , F15D1/00 , F26B3/12 , F26B21/00

Patent Agency Ranking