公开(公告)号：JPS61252648A

公开(公告)日：1986-11-10

申请号：JP1598586

申请日：1986-01-29

Applicant: IBM

Inventor： CLODGO DONNA JEAN ,  PREVITI-KELLY ROSEMARY ANN ,  WALTON ERICK GREGORY

IPC: H01L21/3205 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/768 ,  H05K3/14

公开(公告)号：DE3683461D1

公开(公告)日：1992-02-27

申请号：DE3683461

申请日：1986-10-07

Applicant: IBM

Inventor： CLODGO DONNA JEAN ,  PREVITI-KELLY ROSEMARY ANN ,  WALTON ERICK GREGORY

IPC: B32B27/00 ,  C08G77/38 ,  C08J5/18 ,  C09D183/04 ,  H01L21/312

Abstract: By hydrolyzing an organoalkoysilane monomer at high concentration in solution to form a silanol, allowing the silanol to age to produce a low molecular weight oligomer, spin-applying the oligomer onto a substrate to form a discrete film of highly associated cyclic oligomer thereon, heat treating the oligomer film to form a modified ladder-type silsesquioxane condensation polymer, and then oxidizing the silsesquioxane in an 0₂ RIE, an organoglass is formed which presents novel etch properties. The organoglass can be used as an etch-stop layer in a passivation process.

公开(公告)号：DE3685906T2

公开(公告)日：1993-02-04

申请号：DE3685906

申请日：1986-04-15

Applicant: IBM

Inventor： CLODGO DONNA JEAN ,  PREVITI-KELLY ROSEMARY ANN ,  WALTON ERICK GREGORY

IPC: H01L21/3205 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/768 ,  H05K3/14 ,  H01L21/90

公开(公告)号：DE3685906D1

公开(公告)日：1992-08-13

申请号：DE3685906

申请日：1986-04-15

Applicant: IBM

Inventor： CLODGO DONNA JEAN ,  PREVITI-KELLY ROSEMARY ANN ,  WALTON ERICK GREGORY

IPC: H01L21/3205 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/768 ,  H05K3/14 ,  H01L21/90