公开(公告)号：CA1225363A

公开(公告)日：1987-08-11

申请号：CA460823

申请日：1984-08-10

Applicant: IBM

Inventor： BAUM THOMAS H ,  HOULE FRANCES A ,  JONES CAROL R

IPC: H05K3/14 ,  C23C16/18 ,  H01L21/28 ,  H01L21/285 ,  C23C16/48

Abstract: PHOTOCHEMICAL CONVERSION OF SiO TO SiO2 SiO can be photochemically converted to SiO2 by irradiation with ultraviolet light of wavelengths less than 220 nm in an atomosphere including oxygen. The irradiation can be pulsed or continuous radiation, and energy fluences of at least about 5 mJ/cm2 will effect the photochemical reaction. The conversion of SiO to SiO2 can be used to provide an etch-stop in a fabrication process and to provide improved devices and circuits, in technologies such as Josephson and semiconductor device technologies.

公开(公告)号：AU569753B2

公开(公告)日：1988-02-18

申请号：AU3266784

申请日：1984-09-03

Applicant: IBM

Inventor： BAUM THOMAS H ,  HOULE FRANCES ANNE ,  JONES CAROL R

IPC: H05K3/14 ,  C23C16/18 ,  H01L21/28 ,  H01L21/285 ,  C23C11/02

公开(公告)号：AU3266784A

公开(公告)日：1985-03-21

申请号：AU3266784

申请日：1984-09-03

Applicant: IBM

Inventor： BAUM THOMAS H ,  HOULE FRANCES ANNE ,  JONES CAROL R

IPC: H05K3/14 ,  C23C16/18 ,  H01L21/28 ,  H01L21/285 ,  C23C11/02