公开(公告)号：DE3561404D1

公开(公告)日：1988-02-18

申请号：DE3561404

申请日：1985-06-03

Applicant: IBM

Inventor： PERRY CHARLES HAMPTON ,  SHAW ROBERT REEVES

IPC: C23C8/10 ,  H01L21/316 ,  H01L23/12 ,  H05K1/03 ,  H05K3/22 ,  C23C8/12 ,  B32B15/04

Abstract: A method is taught for repairing pinholes in dielectric layers and thereby avoiding metal shorts. The method is applied after the dielectric has been deposited on a base of conductive metallurgy and involves heating the metal-dielectric layers in an oxygen ambient and thereby oxidizing any exposed metal. The metal-oxide formed in the pinhole effectively insulates the underlying metal from a subsequently deposited metal; and, hence acts to prevent metal-to-metal shorts.