公开(公告)号：CA1214426A

公开(公告)日：1986-11-25

申请号：CA415906

申请日：1982-11-18

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M ,  MORGAN WILLIAM M

IPC: C25D3/06

Abstract: TRIVALENT CHROMIUM ELECTROPLATING SOLUTION AND BATH A chromium electroplating solution in which the source of chromium is an aqueous solution of chromium (III) complexes. The complexes are selected from a solution of chromium (III) and at least one of aspartic acid or an organic compound having a -C=S group or a -C-S- group. A supporting electrolyte is chloride free and comprises a mixture of sodium and potassium sulphates in a concentration sufficient to provide electrical conductivity for the plating process. The concentration of sodium sulphate is in the range of about 0.1 to 1 Molar and the concentration of potassium sulphate is about 1 Molar.

公开(公告)号：CA1209088A

公开(公告)日：1986-08-05

申请号：CA415396

申请日：1982-11-12

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M ,  MORGAN WILLIAM M

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

Abstract: ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS A chromium electroplating electrolyte containing trivalent chromium ions a complexant, a buffer agent and organic compound having a -C=S group or a -C-S group within the molecule for promoting chromium deposition. The complexant is preferably selected so that the stability constant K1 of the chromium complex is in the range 108

公开(公告)号：FR2421961A1

公开(公告)日：1979-11-02

申请号：FR7905102

申请日：1979-02-20

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  VIGAR JAMES M

IPC: C23F3/00 ,  C25D3/06 ,  C25D5/48

公开(公告)号：CA1120427A

公开(公告)日：1982-03-23

申请号：CA324906

申请日：1979-04-04

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M

IPC: C25D3/06 ,  C25D17/00 ,  C25D17/10

Abstract: This specification relates to the electroplating of metals and in particular to an electroplating bath having an acolyte separated from the catholyte by a cation exchange membrane. This specification provides an electroplating bath having an anolyte separated from a catholyte by a perfluorinated cation exchange membrane. One use of the present invention is in trivalent chromium plating solutions wherein oxidation of Cr(III) ions to Cr(VI) occurs at the anode and accumulation of Cr(VI) ions in the plating solution ultimately results in the cessation of plating. The use of perfluorinated cation exchange membranes prevents this anode reaction, with negligible increase in the plating voltage. The anolyte preferably has a depolarising species therein capable of reducing the electrode potential of the anode when the bath is in use. In addition the pH of the catholyte can be stabilised by arranging the pH of the anolyte to allow hydrogen transport through the membrane to compensate for hydrogen evolution at the cathode.

公开(公告)号：FR2421962A1

公开(公告)日：1979-11-02

申请号：FR7905103

申请日：1979-02-20

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M

IPC: C25D3/06 ,  C25D17/00 ,  C25D17/10

公开(公告)号：CA1210733A

公开(公告)日：1986-09-02

申请号：CA415388

申请日：1982-11-12

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M ,  MORGAN WILLIAM M

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56 ,  C25D3/04

Abstract: ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 106

公开(公告)号：CA1209089A

公开(公告)日：1986-08-05

申请号：CA415397

申请日：1982-11-12

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M ,  MORGAN WILLIAM M

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

Abstract: ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS A chromium electroplating electrolyte containing a source of trivalent chormium ions, a complexant, a buffer agent and a sulphur species having S-O or S-S bonds for promoting chromium deposition, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 106

公开(公告)号：CA1208159A

公开(公告)日：1986-07-22

申请号：CA415387

申请日：1982-11-12

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M ,  MORGAN WILLIAM M

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

Abstract: ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS A chromium electroplating electrolyte is provided containing trivalent chromium ions, a complexant, a buffer agent and thiocyanate ions for promoting chromium deposition, the thiocyanate having a molar concentration lower than that of the chromium ions and the chromium having a concentration lower than 0.1M.

公开(公告)号：CA1123368A

公开(公告)日：1982-05-11

申请号：CA324902

申请日：1979-04-04

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M

IPC: C23F3/00 ,  C25D3/06 ,  C25D5/48 ,  C25D5/52

Abstract: This disclosure relates a bright dip for chromium electroplated from a solution containing chromium (III) thiocyanate complexes comprising a ferricyanide solution capable of forming complexes with chromium hydroxide species and of detaching the complexes once formed from the surface of an electroplated deposit without significant attack or etching of the deposit. The ferricyanide solution preferably comprises K3Fe(CN)6. The solution is preferably alkaline.