公开(公告)号：EP2515323B1

公开(公告)日：2014-03-19

申请号：EP11163336.8

申请日：2011-04-21

Applicant: IMEC ,  Katholieke Universiteit Leuven, K.U.L. Leuven R&D

Inventor： Mertens, Paul ,  Brems, Steven ,  Camerotto, Elisabeth ,  Hauptmann, Marc

IPC: H01L21/67 ,  B08B3/12 ,  H01L21/306

CPC classification number: H01L21/67057 ,  B08B3/12 ,  H01L21/02096

公开(公告)号：EP2270838B1

公开(公告)日：2019-06-12

申请号：EP10167177.4

申请日：2010-06-24

Applicant: IMEC VZW

Inventor： Brems, Steven ,  Mertens, Paul

IPC: H01L21/67

公开(公告)号：EP2703094A1

公开(公告)日：2014-03-05

申请号：EP12181888.4

申请日：2012-08-27

Applicant: IMEC

Inventor： Brems, Steven ,  Mertens, Paul

IPC: B08B3/12 ,  B06B1/06 ,  A61L2/025

CPC classification number: H01L41/09 ,  B06B1/0622 ,  B06B1/0688 ,  B06B2201/20 ,  B06B2201/71 ,  B08B3/12 ,  H01L21/67086

Abstract: This invention relates to a system for delivering megasonic energy to a liquid, comprising:
- one or more megasonic transducers, each transducer having a single operating frequency within an ultrasound bandwidth and comprising two or more groups of piezoelectric elements arranged in one or more rows; and
- a megasonic generator means for driving the one or more transducers at frequencies within the bandwidth, the generator means being adapted for changing the voltage applied to each group of piezoelectric elements so as to achieve substantially the same maximum acoustic pressure for each group of piezoelectric elements,
the generator means and transducers being constructed and arranged so as to produce ultrasound within the liquid.
Such a system may be part of an apparatus for cleaning a surface of an article such as a semiconductor wafer or a medical implant.

Abstract translation: 本发明涉及一种系统，用于输送兆频超声波能量到液体，其包括： - 一个或多个兆声波转换器，每个换能器具有内的超声带宽和包含两种或在一个或多个行排列的压电元件的多个基团的单个工作频率; 和 - 一个兆声波发生器装置，用于将频带宽度内的频率驱动所述一个或多个换能器，所述发生器装置angepasst用于改变施加到每个组的压电元件的电压，以实现基本上相同的最大声压为每个组压电 元件，发电机和手段换能器被构造和布置以在液体内产生超声波。 这种系统可以是用于清洗制品的表面上的设备的一部分：诸如半导体晶片或医学植入物。

公开(公告)号：EP2270838A3

公开(公告)日：2013-10-16

申请号：EP10167177.4

申请日：2010-06-24

Applicant: IMEC

Inventor： Brems, Steven ,  Mertens, Paul

IPC: H01L21/67

CPC classification number: H01L21/67051 ,  H01L21/67057 ,  Y10S134/902

Abstract: The present invention is related to a method for cleaning a surface of a substrate (6,30), in particular a semiconductor substrate such as a silicon wafer, by the steps of :Positioning the substrate (6,30) so that the surface is at a distance from a piezo-electric transducer (2,32), supplying a cleaning liquid (5) between the substrate and the transducer, applying an oscillating acoustic force to the cleaning liquid by actuating the transducer (2,32), i.e. by applying an alternating current and voltage to said transducer, moving the transducer with respect to the substrate or vice versa, wherein at several points in time during said movement the the following sequence of steps is performed :
measuring the distance between the surface and the transducer, or measuring the phase shift between the current and voltage applied to said transducer, comparing the measured distance to a desired distance, or comparing the measured phase shift to a desired value of the phase shift, adjusting the distance between the surface and the transducer so that said distance is maintained substantially equal to said desired distance, or so that said phase shift remains equal to said desired value of the phase shift. The invention is equally related to an apparatus suitable for performing the method of the invention.

公开(公告)号：EP2703094B1

公开(公告)日：2019-10-02

申请号：EP12181888.4

申请日：2012-08-27

Applicant: IMEC VZW

Inventor： Brems, Steven ,  Mertens, Paul

IPC: B08B3/12 ,  B06B1/06 ,  H01L21/67 ,  A61L2/025

公开(公告)号：EP2270838A2

公开(公告)日：2011-01-05

申请号：EP10167177.4

申请日：2010-06-24

Applicant: IMEC

Inventor： Brems, Steven ,  Mertens, Paul

IPC: H01L21/00

CPC classification number: H01L21/67051 ,  H01L21/67057 ,  Y10S134/902

Abstract: The present invention is related to a method for cleaning a surface of a substrate (6,30), in particular a semiconductor substrate such as a silicon wafer, by the steps of :Positioning the substrate (6,30) so that the surface is at a distance from a piezo-electric transducer (2,32), supplying a cleaning liquid (5) between the substrate and the transducer, applying an oscillating acoustic force to the cleaning liquid by actuating the transducer (2,32), i.e. by applying an alternating current and voltage to said transducer, moving the transducer with respect to the substrate or vice versa, wherein at several points in time during said movement the the following sequence of steps is performed :
measuring the distance between the surface and the transducer, or measuring the phase shift between the current and voltage applied to said transducer, comparing the measured distance to a desired distance, or comparing the measured phase shift to a desired value of the phase shift, adjusting the distance between the surface and the transducer so that said distance is maintained substantially equal to said desired distance, or so that said phase shift remains equal to said desired value of the phase shift. The invention is equally related to an apparatus suitable for performing the method of the invention.

Abstract translation: 本发明涉及一种用于清洁表面的基板（6.30），特别是半导体衬底：如硅晶片，通过以下步骤：定位所述基板（6.30），因此DASS模具表面是 在从压电换能器（2.32）供给的基板和换能器之间的清洗液（5），通过致动所述换能器（2.32）向振荡声学力到清洗液体中的距离，即 通过施加交变电流和电压给所述换能器，相对于所述基底或反之亦然移动换能器，所述运动期间的时间在几个点worin所述的以下步骤顺序进行：测量所述表面和换能器之间的距离 或测量的电流和电压施加到所述换能器，所测量的距离进行比较，以期望的距离，或者比较所测量的相移的相移的希望的值，调整表面和换能器，以便之间的距离之间的相移 在于：所述距离保持基本上等于所述期望的距离，从而或使所述的相移保持等于相移的所述所需值。 本发明涉及同样的合适的用于执行本发明的方法的装置。

公开(公告)号：EP3913356A1

公开(公告)日：2021-11-24

申请号：EP20175167.4

申请日：2020-05-18

Applicant: Imec VZW ,  Katholieke Universiteit Leuven KU Leuven Research & Development

Inventor： Leonhardt, Alessandra ,  Lockhart de la Rosa, Cesar Javier ,  De Gendt, Stefan ,  Huyghebaert, Cedric ,  Brems, Steven ,  Nuytten, Thomas

IPC: G01N21/64

Abstract: According to the method of the invention, a spot on a layer (3) of a 2D semiconductor material deposited on a support substrate (2;20,21) is irradiated so as to generate excitons, so that photons are emitted from the layer. The photoluminescence spectrum is recorded and this is repeated for different values of the charge carrier concentration in the layer. The modulation of the charge carrier concentration may be realized by modulating the output power of the light source (1) used to irradiate the sample, preferably a laser. The relation is thereby recorded between the ratio of the photoluminescence intensity of a first peak in the spectrum related to radiative recombination from indirect bandgaps to the intensity of a second peak in the spectrum related to radiative recombination from direct bandgaps, and the carrier concentration. This recorded relation is fitted to a theoretical model of the ratio that takes into account multiple recombination mechanisms, radiative and non-radiative. From this fitting process, the trap density within the bandgap is derived. The invention is equally related to an apparatus configured to perform the method of the invention.

公开(公告)号：EP2315235B1

公开(公告)日：2019-04-24

申请号：EP09173658.7

申请日：2009-10-21

Applicant: IMEC VZW

Inventor： Mertens, Paul ,  Brems, Steven

IPC: H01L21/67 ,  H01L21/02 ,  B08B3/02 ,  B08B3/12

公开(公告)号：EP3333126A1

公开(公告)日：2018-06-13

申请号：EP17206508.8

申请日：2017-12-11

Applicant: IMEC vzw ,  Katholieke Universiteit Leuven

Inventor： Brems, Steven ,  Huyghebaert, Cedric ,  Verguts, Ken ,  De Gendt, Stefan

IPC: C01B32/194

CPC classification number: B32B43/006 ,  B32B9/007 ,  B32B15/04 ,  B32B37/025 ,  B32B2311/06 ,  C01B32/184 ,  C01B32/194 ,  C01B2204/02 ,  C07F7/081 ,  C07F7/10 ,  C25F5/00 ,  Y02P20/582

Abstract: According to an aspect of the present inventive concept there is provided method for releasing a graphene layer from a template substrate on which the graphene layer is provided, the method comprising:
subjecting the graphene layer and the template substrate to a water treatment by soaking the graphene layer and the template substrate in water such that water is intercalated between the template substrate and the graphene layer; and
subjecting the graphene layer and the template substrate to a delamination process, thereby releasing the graphene layer from the template substrate.

公开(公告)号：EP2315235A1

公开(公告)日：2011-04-27

申请号：EP09173658.7

申请日：2009-10-21

Applicant: IMEC

Inventor： Mertens, Paul ,  Brems, Steven

IPC: H01L21/00

CPC classification number: H01L21/02052 ,  B08B3/02 ,  B08B3/12 ,  H01L21/67051 ,  H01L21/67057

Abstract: The present invention is related to a method and apparatus for cleaning semiconductor substrates, wherein a nucleation structure is mounted facing a surface of the substrate to be cleaned, said nucleation structure having nucleation sites on a surface of the structure. The substrate and structure are brought into contact with a cleaning liquid, which is subsequently subjected to acoustic waves of a given frequency, e.g. megasonic waves. The nucleation template features easier nucleation formation than the surface that needs to be cleaned. This could be obtained in different ways: make a template with a higher contact angle when in contact with the liquid than the substrate surface to be clean. Therefore, bubbles nucleate on the structure and not on the surface to be cleaned. The invention is related to an apparatus comprising a tank, a transducer and a means for mounting the substrate and nucleation structure in the above manner.

Abstract translation: 本发明涉及一种用于清洁半导体衬底的方法和装置，其中成核结构被安装成面对待清洁衬底的表面，所述成核结构在结构表面上具有成核位置。 衬底和结构与清洁液接触，清洗液随后经受给定频率的声波，例如， 兆声波。 成核模板具有比需要清洁的表面更容易的成核形成。 这可以通过不同的方式获得：当与液体接触时，制造具有比衬底表面更清洁的接触角更高的接触角的模板。 因此，气泡在结构上成核，而不是待清洁的表面。 本发明涉及一种包括罐，换能器和用于以上述方式安装基底和成核结构的装置的装置。