公开(公告)号：WO2019032730A1

公开(公告)日：2019-02-14

申请号：PCT/US2018/045852

申请日：2018-08-08

Applicant: KLA-TENCOR CORPORATION

Inventor： BLASENHEIM, Barry ,  SAPIENS, Noam ,  FRIEDMANN, Michael ,  ROVIRA, Pablo

IPC: G03F7/20 ,  G03F1/84 ,  H01L21/66 ,  H01L21/67

Abstract: In some embodiments, a collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and an aperture mask to provide an adjustable aperture for the reflected optical beam. The aperture mask includes a plurality of opaque plates with adjustable positions. The collection system also includes a spectrometer to receive the reflected optical beam. The aperture mask is situated between the chuck and the spectrometer along the optical axis.

公开(公告)号：WO2012018674A2

公开(公告)日：2012-02-09

申请号：PCT/US2011/045784

申请日：2011-07-28

Applicant: KLA-TENCOR CORPORATION ,  MANASSEN, Ammon ,  KANDEL, Daniel ,  BARUCH, Moshe ,  SELIGSON, Joel ,  SVIZHER, Alexander ,  COHEN, Guy ,  ROTEM, Efraim ,  BACHAR, Ohad ,  NEGRI, Daria ,  SAPIENS, Noam

Inventor： MANASSEN, Ammon ,  KANDEL, Daniel ,  BARUCH, Moshe ,  SELIGSON, Joel ,  SVIZHER, Alexander ,  COHEN, Guy ,  ROTEM, Efraim ,  BACHAR, Ohad ,  NEGRI, Daria ,  SAPIENS, Noam

IPC: H01L21/027

CPC classification number: G03F7/70633 ,  G01N21/55 ,  G03F7/70616

Abstract: The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.

Abstract translation: 本发明包括照明源，至少一个照明对称化模块（ISM），其被配置为使从照明源发出的光的至少一部分对称化;第一分束器，其被配置为将第一部分 由ISM沿着物体路径沿着参考路径沿着物体路径被ISM处理到一个或多个样本的表面以及由ISM处理的第二部分光;以及沿着主光轴布置的检测器，其中检测器被配置为收集 从一个或多个样本的表面反射的一部分光。

公开(公告)号：EP3779598A3

公开(公告)日：2021-04-14

申请号：EP20177915.4

申请日：2012-04-04

Applicant: Kla-Tencor Corporation

Inventor： KANDEL, Daniel ,  COHEN, Guy ,  KLEIN, Dana ,  LEVINSKI, Vladimir ,  SAPIENS, Noam ,  SHULMAN, Alex ,  KAMENETSKY, Vladimir ,  AMIT, Eran ,  VAKSHTEIN, Irina

IPC: G03F7/20

Abstract: The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.

公开(公告)号：WO2019027744A1

公开(公告)日：2019-02-07

申请号：PCT/US2018/043583

申请日：2018-07-25

Applicant: KLA-TENCOR CORPORATION

Inventor： HILL, Andrew V. ,  SHCHEGROV, Andrei ,  MANASSEN, Amnon ,  SAPIENS, Noam

IPC: H01L21/66 ,  H01L23/544

Abstract: An overlay metrology system includes an overlay metrology tool configurable to generate overlay signals with a plurality of recipes and further directs an illumination beam to an overlay target and collects radiation emanating from the overlay target in response to the at least a portion of the illumination beam to generate the overlay signal with the particular recipe. The overlay metrology system further acquires two or more overlay signals for a first overlay target using two or more unique recipes, subsequently acquires two or more overlay signals for a second overlay target using the two or more unique recipes, determines candidate overlays for the first and second overlay targets based on the two or more overlay signals for each target, and determines output overlays for the first and second overlay targets based on the two or more candidate overlays for each target.

公开(公告)号：WO2017053581A1

公开(公告)日：2017-03-30

申请号：PCT/US2016/053136

申请日：2016-09-22

Applicant: KLA-TENCOR CORPORATION

Inventor： FU, Jiyou ,  SAPIENS, Noam ,  PETERLINZ, Kevin A. ,  PANDEV, Stilian Ivanov

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/66

CPC classification number: G03F9/7065 ,  G03F7/70633 ,  G03F9/7046

Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light that is projected onto an overlay metrology target such that the direction of the line shaped beam is aligned with the direction of extent of a grating structure of the overlay metrology target. Collected light is dispersed across a detector according to AOI in one direction and according to wavelength in another direction. The measured signal at each detector pixel is associated with a particular AOI and wavelength. The collected light includes first order diffracted light, zero order diffracted light, or a combination thereof. In some embodiments, first order diffracted light and zero order diffracted light are detected over separate areas of the detector.

Abstract translation: 分光光束分布测量系统同时检测大波长范围和大范围入射角（AOI）的测量信号。 在一个方面，将多波长照明光束重新形成为投影到覆盖计量目标上的窄线形的光束，使得线状光束的方向与覆盖层的光栅结构的范围的方向对准 计量目标。 收集的光在一个方向上根据AOI在根据另一方向的波长的情况下分散在检测器上。 每个检测器像素处的测量信号与特定的AOI和波长相关联。 所收集的光包括一级衍射光，零级衍射光或其组合。 在一些实施例中，在检测器的不同区域上检测一级衍射光和零级衍射光。

公开(公告)号：WO2015175425A1

公开(公告)日：2015-11-19

申请号：PCT/US2015/030192

申请日：2015-05-11

Applicant: KLA-TENCOR CORPORATION

Inventor： SAPIENS, Noam ,  SHCHEGROV, Andrei V. ,  PANDEV, Stilian

IPC: H01L21/66

CPC classification number: G01N21/93 ,  G01B2210/56 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2201/06113 ,  G01N2201/062 ,  G01N2201/10 ,  G01N2201/1296

Abstract: In one embodiment, apparatus and methods for determining a parameter of a target are disclosed. A target having an imaging structure and a scatterometry structure is provided. An image of the imaging structure is obtained with an imaging channel of a metrology tool. A scatterometry signal is also obtained from the scatterometry structure with a scatterometry channel of the metrology tool. At least one parameter, such as overlay error, of the target is determined based on both the image and the scatterometry signal.

Abstract translation: 在一个实施例中，公开了用于确定目标的参数的装置和方法。 提供具有成像结构和散射测量结构的目标。 使用计量工具的成像通道获得成像结构的图像。 散射测量信号也通过散度仪结构与计量工具的散射测量通道获得。 基于图像和散射测量信号确定目标的至少一个参数，例如重叠误差。

公开(公告)号：WO2013002988A2

公开(公告)日：2013-01-03

申请号：PCT/US2012/041273

申请日：2012-06-07

Applicant: KLA-TENCOR CORPORATION ,  MANASSEN, Amnon ,  SELIGSON, Joel ,  SAPIENS, Noam

Inventor： MANASSEN, Amnon ,  SELIGSON, Joel ,  SAPIENS, Noam

CPC classification number: G01J1/4257 ,  G02B21/0016 ,  G02B21/082 ,  G02B21/365 ,  G02B26/0833 ,  G03F7/70633

Abstract: An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.

Abstract translation: 光学系统可以包括目标，照明源，具有被配置为将照明引导到物镜上的照明光学器件的照明系统，以及分别位于瞳孔共轭平面和场共轭平面处的至少两个动态光学阵列器件 照明光学。 动态光学阵列装置被配置为控制从照明系统耦合到目标的照明的一个或多个特性。

公开(公告)号：WO2014004555A1

公开(公告)日：2014-01-03

申请号：PCT/US2013/047682

申请日：2013-06-25

Applicant: KLA-TENCOR CORPORATION

Inventor： SAPIENS, Noam ,  SELIGSON, Joel ,  LEVINSKI, Vladimir ,  KANDEL, Daniel ,  FELER, Yoel ,  BRINGOLTZ, Barak ,  MANASSEN, Amnon ,  BENISTY, Eliav

IPC: H01L21/66

CPC classification number: G01N21/4788 ,  G01N2201/06113 ,  G02B27/56 ,  G02B27/58

Abstract: Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed, the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.

Abstract translation: 本文提供的计量系统和方法包括位于系统的物镜和目标之间的光学元件。 光学元件布置成增强目标反射的辐射消散模式。 公开了各种配置，光学元件可以包括固体浸没透镜，莫尔元件和固体浸没光学元件的组合，不同设计的介电金属 - 电介质堆叠以及用于放大照明辐射的渐逝模式的谐振元件。 计量系统和方法可配置为各种计量类型，包括成像和散射方法。

公开(公告)号：WO2012109348A1

公开(公告)日：2012-08-16

申请号：PCT/US2012/024320

申请日：2012-02-08

Applicant: KLA-TENCOR CORPORATION ,  SELIGSON, Joel, L. ,  SAPIENS, Noam ,  KANDEL, Daniel

Inventor： SELIGSON, Joel, L. ,  SAPIENS, Noam ,  KANDEL, Daniel

IPC: G03F9/00

CPC classification number: G01N21/47 ,  G01B11/02 ,  G01N21/00 ,  G03F7/70633

Abstract: Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.

Abstract translation: 计量工具中的对比度增强可以包括产生照射光束，将所产生的光束的一部分引导到空间光调制器（SLM）的表面上，引导入射到SLM的表面上的所产生的光束的至少一部分通过 孔径的孔径停止并且连接到一个或多个样本的一个或多个目标结构上，并且通过使用SLM生成通过孔径透射的照明的选择的照明光瞳函数，以便建立一个或多个场图像的对比度 所述一个或多个目标结构在所选择的对比度阈值之上，以及利用所选择的照明光瞳功能对所述一个或多个目标结构执行一个或多个度量测量。

公开(公告)号：EP2867918A1

公开(公告)日：2015-05-06

申请号：EP13809023.8

申请日：2013-06-25

Applicant: Kla-Tencor Corporation

Inventor： SAPIENS, Noam ,  SELIGSON, Joel ,  LEVINSKI, Vladimir ,  KANDEL, Daniel ,  FELER, Yoel ,  BRINGOLTZ, Barak ,  MANASSEN, Amnon ,  BENISTY, Eliav

IPC: H01L21/66

CPC classification number: G01N21/4788 ,  G01N2201/06113 ,  G02B27/56 ,  G02B27/58

Abstract: Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.