公开(公告)号：US10466031B2

公开(公告)日：2019-11-05

申请号：US15538846

申请日：2016-08-26

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Young-Sik Ghim ,  Hyug-Gyo Rhee ,  Yun Woo Lee

IPC: G01B9/02 ,  G01B11/06 ,  G06F17/16 ,  G06F17/17 ,  G01B11/24

Abstract: The present disclosure relates to an apparatus for measuring a thickness and a surface profile of a multilayered film structure using an imaging spectral optical system and a measuring method. More specifically, the present disclosure relates to a method and an apparatus which measure a thickness and a surface profile of a multilayered thin film structure by applying a method for obtaining an absolute reflectance value for an object to be measured having a multilayered thin film using a reflected light measuring method and extracting a phase from an interference signal with a reference mirror using a phase shift algorithm.

公开(公告)号：US11486700B2

公开(公告)日：2022-11-01

申请号：US16651792

申请日：2019-07-29

Applicant: Korea Research Institute of Standards and Science

Inventor： Young-Sik Ghim ,  The Manh Nguyen ,  Hyug-Gyo Rhee

IPC: G01B11/30 ,  G01B11/25

Abstract: The present disclosure is related to a system and a method for 3D shape measurement of a freeform surface based on high-speed deflectometry using composite patterns. More particularly, a system for profile measurement based on high-speed deflectometry using composite patterns includes: a composite pattern generation part to project a composite pattern generated by synthesizing patterns having different frequencies to a measurement object; a detector to acquire images of a deformed composite pattern reflected from the measurement object; and a phase acquisition part to acquire wrapped phases by each frequency from the composite pattern and unwrapped phases from the respective wrapped phases.

公开(公告)号：US11243070B2

公开(公告)日：2022-02-08

申请号：US16957801

申请日：2020-02-27

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Young-Sik Ghim ,  Hyug-gyo Rhee

IPC: G01J3/02 ,  G01B11/06 ,  G01N21/41 ,  G02B27/28

Abstract: In the embodiment in association with the present disclosure, an apparatus and method for multilayer thin film thickness measurement using single-shot angle-resolved spectral reflectometry are provided which allow simultaneously obtaining the absolute reflectance and phase data of a measurement object over a broad wavelength range and wide incident angle according to various polarization states by a single-shot measurement.