公开(公告)号：US07614421B2

公开(公告)日：2009-11-10

申请号：US11360732

申请日：2006-02-23

Applicant: W. Karl Olander ,  Matthew B. Donatucci ,  Luping Wang ,  Michael J. Wodjenski

Inventor： W. Karl Olander ,  Matthew B. Donatucci ,  Luping Wang ,  Michael J. Wodjenski

IPC: F16K3/36 ,  B08B9/027 ,  G05B11/01

CPC classification number: F17C13/04 ,  F17C5/00 ,  F17C2201/0109 ,  F17C2201/0119 ,  F17C2201/032 ,  F17C2201/056 ,  F17C2201/058 ,  F17C2205/0111 ,  F17C2205/0176 ,  F17C2205/0326 ,  F17C2205/0332 ,  F17C2205/0335 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0391 ,  F17C2205/0394 ,  F17C2221/012 ,  F17C2221/014 ,  F17C2221/016 ,  F17C2221/037 ,  F17C2221/05 ,  F17C2223/0123 ,  F17C2223/036 ,  F17C2225/0123 ,  F17C2225/033 ,  F17C2225/035 ,  F17C2225/038 ,  F17C2227/044 ,  F17C2227/045 ,  F17C2250/032 ,  F17C2250/043 ,  F17C2260/036 ,  F17C2260/044 ,  F17C2270/0518 ,  Y02E60/321 ,  Y10T137/0324 ,  Y10T137/0419 ,  Y10T137/2569 ,  Y10T137/4259 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/7762 ,  Y10T137/7793 ,  Y10T137/8158 ,  Y10T137/87249

Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.

Abstract translation: 使用与气体歧管以选择性流动关系耦合的气体源分配气体的装置和方法。 气体歧管包括用于将气体排放到气体使用区域的流动回路，并且气体源包括在超大气压下容纳气体的压力调节气体源容器。 压力调节的气体源容器可以布置有在容器内或容器内的压力调节器，以及与容器流动关系的流量控制阀，使得从容器分配的气体在流过流量控制器之前流过调节器 阀，并进入气体歧管。 该装置和方法允许提高半导体工艺中使用的有毒或其他有害气体的储存和分配的安全性。

公开(公告)号：US20090099016A1

公开(公告)日：2009-04-16

申请号：US12158318

申请日：2006-12-19

Applicant: J. Donald Carruthers ,  Xueping Xu ,  Luping Wang

Inventor： J. Donald Carruthers ,  Xueping Xu ,  Luping Wang

IPC: D01F9/12 ,  C23C16/02 ,  C01B31/08 ,  B01J8/00

CPC classification number: B01J20/205 ,  B01J20/20 ,  B01J21/185 ,  B01J23/74 ,  B01J23/881 ,  B01J23/882 ,  B01J23/883 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/162 ,  C01B2202/02 ,  C01B2202/08 ,  C01B2202/36 ,  Y02P20/582

Abstract: A method and apparatus for manufacture of carbon nanotubes, in which a substrate is contacted with a hydrocarbonaceous feedstock containing a catalytically effective metal to deposit the feedstock on the substrate, followed by oxidation of the deposited feedstock to remove hydrocarbonaceous and carbonaceous components from the substrate, while retaining the catalytically effective metal thereon, and contacting of the substrate having retained catalytically effective metal thereon with a carbon source material to grow carbon nanotubes on the substrate. The manufacture can be carried out with a petroleum feedstock such as an oil refining atmospheric tower residue, to produce carbon nanotubes in high volume at low cost. Also disclosed is a composite including porous material having single-walled carbon nanotubes in pores thereof.

Abstract translation: 一种用于制造碳纳米管的方法和装置，其中将基底与含有催化有效金属的含烃原料接触以将原料沉积在基底上，随后氧化沉积的原料以从基底中除去含碳和碳质的组分， 同时在其上保留催化有效的金属，并且将具有保留的催化有效金属的基材与碳源材料接触以在基材上生长碳纳米管。 可以用石油原料如炼油大气塔渣进行制造，以低成本大量生产碳纳米管。 还公开了一种复合材料，其包括在其孔中具有单壁碳纳米管的多孔材料。

公开(公告)号：US07437060B2

公开(公告)日：2008-10-14

申请号：US11157733

申请日：2005-06-21

Applicant: Luping Wang ,  Thomas H. Baum ,  Chongying Xu

Inventor： Luping Wang ,  Thomas H. Baum ,  Chongying Xu

IPC: B01D7/00

CPC classification number: C23C16/4481 ,  B01D1/0082

Abstract: A delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.

Abstract translation: 一种用于以对于半导体制造应用具有特殊用途的受控速率蒸发并递送蒸发的固体和液体前体材料的输送系统。 该系统包括蒸发容器，处理工具和它们之间的连接蒸汽管线，其中系统还包括输入流量控制器和/或输出流量控制器，以向蒸发容器提供可蒸发的源材料的受控输送， 蒸发的原料流向加工工具的流量。

公开(公告)号：US20050263075A1

公开(公告)日：2005-12-01

申请号：US11157733

申请日：2005-06-21

Applicant: Luping Wang ,  Thomas Baum ,  Chongying Xu

Inventor： Luping Wang ,  Thomas Baum ,  Chongying Xu

IPC: B01D1/00 ,  B01D7/00 ,  C23C14/00 ,  C23C16/00 ,  C23C16/448

CPC classification number: C23C16/4481 ,  B01D1/0082

Abstract: A delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.

Abstract translation: 一种用于以对于半导体制造应用具有特殊用途的受控速率蒸发并递送蒸发的固体和液体前体材料的输送系统。 该系统包括蒸发容器，处理工具和它们之间的连接蒸汽管线，其中系统还包括输入流量控制器和/或输出流量控制器，以向蒸发容器提供可蒸发的源材料的受控输送， 蒸发的原料流向加工工具的流量。

公开(公告)号：US06620225B2

公开(公告)日：2003-09-16

申请号：US10043731

申请日：2002-01-10

Applicant: Luping Wang ,  Doug Neugold

Inventor： Luping Wang ,  Doug Neugold

IPC: B01D5304

CPC classification number: F17C11/007 ,  F17C11/00 ,  F17C2205/0338 ,  F17C2205/0391 ,  F17C2270/0518 ,  Y02E60/321 ,  Y10S95/90 ,  Y10S502/526

Abstract: The invention relates to a fluid storage and delivery system utilizing a porous metal matrix that comprises at least one Group VIII metal or Group IB metal therein. In one aspect of the invention, such porous metal matrix forms a solid-phase metal adsorbent medium, characterized by an average pore diameter of from about 0.5 nm to about 2.0 nm and a porosity of from about 10% to about 30%. Such solid-phase metal adsorbent medium is particularly useful for sorptively storing and desoprotively dispensing a low vapor pressure fluid, e.g., ClF3, HF, GeF4, Br2, etc. In another aspect of the invention, such porous metal matrix forms a solid-phase metal sorbent, characterized by an average pore diameter of from about 0.25 &mgr;m to about 500 &mgr;m and a porosity of from about 15% to about 95%, which can effectively immobilize low vapor pressure liquefied gas.

Abstract translation: 本发明涉及一种利用多孔金属基质的流体储存和输送系统，该多孔金属基质包含至少一种第VIII族金属或IB族金属。 在本发明的一个方面，这种多孔金属基质形成固相金属吸附剂介质，其特征在于平均孔径为约0.5nm至约2.0nm，孔隙率为约10％至约30％。 这样的固相金属吸附剂介质特别适用于吸附储存和反向分配低蒸气压流体，例如ClF 3，HF，GeF 4，Br 2等。在本发明的另一方面，这种多孔金属基质形成固相 金属吸附剂，其特征在于平均孔径为约0.25μm至约500μm，孔隙率为约15％至约95％，其可以有效地固定低蒸气压液化气体。

公开(公告)号：US20090272272A1

公开(公告)日：2009-11-05

申请号：US12364800

申请日：2009-02-03

Applicant: W. Karl Olander ,  Joseph D. Sweeney ,  Luping Wang

Inventor： W. Karl Olander ,  Joseph D. Sweeney ,  Luping Wang

IPC: B03C3/38 ,  B01D50/00

CPC classification number: C23C14/48 ,  B01D53/74 ,  C23C14/564 ,  Y10S438/905 ,  Y10S438/909

Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.

Abstract translation: 一种半导体制造工艺设备，其中需要使用其中的排气用于其操作，这种设施包括洁净室和灰色房间部件，洁净室在其中具有至少一个半导体制造工具，并且其中排气流过干净的区域 房间。 该设施包括排气处理设备，其布置成（i）在其流过所述洁净室的所述区域之后接收排气，（ii）产生经处理的排气，以及（iii）将经处理的排气再循环到环境空气环境 在设施中，例如，到设施的灰色房间。

公开(公告)号：US20050019026A1

公开(公告)日：2005-01-27

申请号：US10625179

申请日：2003-07-23

Applicant: Luping Wang ,  Thomas Baum ,  Chongying Xu

Inventor： Luping Wang ,  Thomas Baum ,  Chongying Xu

IPC: B01D1/00 ,  B01D7/00 ,  C23C14/00 ,  C23C16/00 ,  C23C16/448

CPC classification number: C23C16/4481 ,  B01D1/0082

Abstract: The present invention relates to a delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.

Abstract translation: 本发明涉及一种用于以对于半导体制造应用具有特殊用途的受控速率蒸发和输送蒸发的固体和液体前体材料的输送系统。 该系统包括蒸发容器，处理工具和它们之间的连接蒸汽管线，其中系统还包括输入流量控制器和/或输出流量控制器，以向蒸发容器提供可蒸发的源材料的受控输送， 蒸发的原料流向加工工具的流量。

公开(公告)号：US06716271B1

公开(公告)日：2004-04-06

申请号：US10282377

申请日：2002-10-29

Applicant: Jose Arno ,  Edward Sturm ,  Luping Wang ,  James Dietz

Inventor： Jose Arno ,  Edward Sturm ,  Luping Wang ,  James Dietz

IPC: B01D5304

CPC classification number: B01D53/04 ,  B01D2253/102 ,  B01D2259/40083 ,  B01D2259/40086 ,  B01D2259/40088 ,  B01D2259/4525 ,  Y10S95/901

Abstract: A germane storage and dispensing system, in which germane gas is sorptively retained on an activated carbon sorbent medium in a vessel containing adsorbed and free germane gas. The activated carbon sorbent medium is deflagration-resistant in relation to the germane gas adsorbed thereon, i.e., under deflagration conditions of 65° C. and 650 torr, under which free germane gas undergoes deflagration, the activated carbon sorbent medium does not sustain deflagration of the adsorbed germane gas or thermally desorb the germane gas so that it undergoes subsequent deflagration. The deflagration-resistance of the activated carbon sorbent medium is promoted by pre-treatment of the sorbent material to remove extraneous sorbables therefrom and by maintaining the fill level of the sorbent medium in the gas storage and dispensing vessel at a substantial value, e.g., of at least 30%.

Abstract translation: 锗烷存储和分配系统，其中将锗烷气体吸附保留在含有吸附和游离的锗烷气体的容器中的活性炭吸附剂介质上。 活性炭吸附剂介质相对于其上吸附的锗烷气体，即在65℃和650托的爆燃条件下，具有爆燃阻力，在此条件下，游离的锗烷气体经历爆燃，活性炭吸附剂介质不能保持爆燃 吸附的锗烷气体或热解吸锗烷气体，使其经历随后的爆燃。 通过预处理吸附剂材料来促进活性炭吸附剂介质的防爆性，以从其中除去外来的吸附物，并且通过将吸附剂介质在气体储存和分配容器中的填充水平保持在基本值，例如 至少30％。

公开(公告)号：US06474076B2

公开(公告)日：2002-11-05

申请号：US10017970

申请日：2001-11-12

Applicant: Luping Wang ,  Glenn M. Tom ,  James A. Dietz ,  Steven M. Lurcott ,  Steven J. Hultquist

Inventor： Luping Wang ,  Glenn M. Tom ,  James A. Dietz ,  Steven M. Lurcott ,  Steven J. Hultquist

IPC: F17C704

CPC classification number: F17C7/04 ,  F17C7/02 ,  F17C13/025 ,  F17C13/04 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/032 ,  F17C2201/058 ,  F17C2203/0643 ,  F17C2203/0646 ,  F17C2205/018 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0382 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2223/0123 ,  F17C2223/0153 ,  F17C2223/035 ,  F17C2250/032 ,  F17C2250/034 ,  F17C2250/043 ,  F17C2250/0636 ,  F17C2265/04 ,  F17C2270/025 ,  F17C2270/05 ,  F17C2270/0518

Abstract: A fluid storage and dispensing system including a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid. The vessel includes a fluid discharge port for discharging fluid from the vessel. A pressure regulating element in the interior volume of the fluid storage and dispensing vessel is arranged to flow fluid therethrough to the fluid discharge port at a set pressure for dispensing thereof. A controller external of the fluid storage and dispensing vessel is arranged to transmit a control input into the vessel to cause the pressure regulating element to change the set pressure of the fluid flowed from the pressure regulating element to the fluid discharge port. By such arrangement, the respective storage and dispensing operations can have differing regulator set point pressures, as for example a subatmospheric pressure set point for storage and a superatmospheric pressure set point for dispensing.

Abstract translation: 一种流体存储和分配系统，包括包围用于保持流体的内部容积的流体存储和分配容器。 容器包括用于从容器排出流体的流体排出口。 流体存储和分配容器的内部容积中的压力调节元件布置成以一定的压力使流体流过流体排出口，用于分配。 流体存储和分配容器外部的控制器布置成将控制输入传送到容器中，以使压力调节元件将从压力调节元件流出的流体的设定压力改变到流体排出口。 通过这种布置，相应的存储和分配操作可以具有不同的调节器设定点压力，例如用于存储的低于大气压的压力设定点和用于分配的超大气压力设定点。

公开(公告)号：US06360546B1

公开(公告)日：2002-03-26

申请号：US09635961

申请日：2000-08-10

Applicant: Luping Wang ,  Glenn M. Tom ,  James A Dietz ,  Steven M. Lurcott ,  Steven J. Hultquist

Inventor： Luping Wang ,  Glenn M. Tom ,  James A Dietz ,  Steven M. Lurcott ,  Steven J. Hultquist

IPC: F17C704

CPC classification number: F17C7/04 ,  F17C7/02 ,  F17C13/025 ,  F17C13/04 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/032 ,  F17C2201/058 ,  F17C2203/0643 ,  F17C2203/0646 ,  F17C2205/018 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0382 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2223/0123 ,  F17C2223/0153 ,  F17C2223/035 ,  F17C2250/032 ,  F17C2250/034 ,  F17C2250/043 ,  F17C2250/0636 ,  F17C2265/04 ,  F17C2270/025 ,  F17C2270/05 ,  F17C2270/0518

Abstract: A fluid storage and dispensing system including a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid. The vessel includes a fluid discharge port for discharging fluid from the vessel. A pressure regulating element in the interior volume of the fluid storage and dispensing vessel is arranged to flow fluid therethrough to the fluid discharge port at a set pressure for dispensing thereof. A controller external of the fluid storage and dispensing vessel is arranged to transmit a control input into the vessel to cause the pressure regulating element to change the set pressure of the fluid flowed from the pressure regulating element to the fluid discharge port. By such arrangement, the respective storage and dispensing operations can have differing regulator set point pressures, as for example a subatmospheric pressure set point for storage and a super atmospheric pressure set point for dispensing.

Abstract translation: 一种流体存储和分配系统，包括包围用于保持流体的内部容积的流体存储和分配容器。 容器包括用于从容器排出流体的流体排出口。 流体存储和分配容器的内部容积中的压力调节元件布置成以一定的压力使流体流过流体排出口，用于分配。 流体存储和分配容器外部的控制器布置成将控制输入传送到容器中，以使压力调节元件将从压力调节元件流出的流体的设定压力改变到流体排出口。 通过这种布置，相应的存储和分配操作可以具有不同的调节器设定点压力，例如用于存储的低于大气压的压力设定点和用于分配的超大气压设定点。