Method of fabrication of a microfluidic device
    1.
    发明申请
    Method of fabrication of a microfluidic device 有权
    微流体装置的制造方法

    公开(公告)号:US20030226604A1

    公开(公告)日:2003-12-11

    申请号:US10440515

    申请日:2003-05-16

    Abstract: The present invention relates to a method of fabricating a microfluidic device including at least two substrates provided with a fluid channel, comprising the steps of: a) etching at least a channel and one or more fluid ports in a first and/or a second substrate; b) depositing a first layer on a surface of the second substrate; c) partially removing the first layer in accordance with a predefined geometry; d) depositing a second layer on top of the first layer and the substrate surface; e) planarizing the second layer so as to smooth the upper surface thereof; f) aligning the first and second substrate; g) bonding the first substrate on the planarized second layer of the second substrate.

    Abstract translation: 本发明涉及一种制造微流体装置的方法,该微流体装置包括具有流体通道的至少两个基板,包括以下步骤:a)至少蚀刻第一和/或第二基板中的通道和一个或多个流体端口 ; b)在第二基板的表面上沉积第一层; c)根据预定几何部分去除第一层; d)在第一层和衬底表面的顶部上沉积第二层; e)平面化第二层以平滑其上表面; f)对准所述第一和第二基板; g)将第一衬底接合在第二衬底的平坦化的第二层上。

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