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公开(公告)号:JP2002211923A
公开(公告)日:2002-07-31
申请号:JP2001000862
申请日:2001-01-05
Applicant: NAT INST FOR MATERIALS SCIENCE
Inventor: IMAI MOTOHARU
Abstract: PROBLEM TO BE SOLVED: To provide a silicon or germanium compound superconducting material which is expected to be a new material for manufacturing a high performance device and to provide a superconductor containing the material. SOLUTION: The silicon or germanium compound superconducting material is represented by the formula Ax(B1-yCy)2 (where 0.8 =3 K critical temperature.
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公开(公告)号:JP2002329865A
公开(公告)日:2002-11-15
申请号:JP2002056484
申请日:2002-03-01
Applicant: NAT INST FOR MATERIALS SCIENCE , CHIKYO TOYOHIRO
Inventor: CHIKYO TOYOHIRO , IMAI MOTOHARU
IPC: H01L21/28 , H01L21/8234 , H01L21/8238 , H01L27/088 , H01L27/092 , H01L29/423 , H01L29/43 , H01L29/49 , H01L29/78
Abstract: PROBLEM TO BE SOLVED: To provide novel gate, CMOS structure and MOS structure exhibiting excellent low resistivity and controllability. SOLUTION: The gate is composed of an intermetallic compound semiconductor having a semiconductor band structure and an electric conductivity in the range of 10 and 10 S.m under a state added with no impurity.
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公开(公告)号:EP1376702A4
公开(公告)日:2007-07-11
申请号:EP02705064
申请日:2002-03-01
Applicant: NAT INST FOR MATERIALS SCIENCE
Inventor: CHIKYO TOYOHIRO , IMAI MOTOHARU
IPC: H01L21/28 , H01L21/8238 , H01L27/092 , H01L29/49
CPC classification number: H01L21/28044 , H01L21/823828 , H01L21/823842 , H01L27/092 , H01L29/4933
Abstract: A gate consisting of an intermetallic compound semiconductor having an electric conductivity of at least 10 S•m and up to 10 S•m with no impurities added and having a semiconductor band structure, and a CMOS structure and a MOS structure using the gate.
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