公开(公告)号：WO2016042530A1

公开(公告)日：2016-03-24

申请号：PCT/IB2015/057205

申请日：2015-09-18

Applicant: PLASMA APP LTD.

Inventor： YARMOLICH, Dmitry

IPC: H01J37/34 ,  C23C14/34 ,  H01J3/02 ,  H01J37/077 ,  H01J37/32

CPC classification number: C23C14/30 ,  C23C14/32 ,  H01J3/025 ,  H01J37/32055 ,  H01J37/3233 ,  H01J37/32422 ,  H01J37/32449 ,  H01J37/32596 ,  H01J37/32816 ,  H01J37/34 ,  H01J37/3467 ,  H01J2237/06366 ,  H01J2237/3137 ,  H01J2237/332

Abstract: A virtual cathode deposition apparatus utilises virtual plasma cathode for generation of high density electron beam to ablate a solid target. A high voltage electrical pulse ionizes gas to produce a plasma which temporarily appears in front of the target and serves as the virtual plasma cathode at the vicinity of target. This plasma then disappears allowing the ablated target material in a form of a plasma plume to propagate toward the substrate. Several virtual cathodes operating in parallel provide plumes that merge into a uniform plasma which when condensing on a nearby substrate leads to wide area deposition of a uniform thickness thin film.

Abstract translation: 虚拟阴极沉积装置利用虚拟等离子体阴极产生高密度电子束以消融固体靶。 高电压电脉冲使气体电离，产生临时出现在靶前方的等离子体，并用作目标附近的虚拟等离子体阴极。 然后该等离子体消失，允许以等离子体羽流形式的烧蚀的靶材料向衬底传播。 并行操作的几个虚拟阴极提供合并成均匀等离子体的羽流，当等离子体在附近的基底上凝结时，导致均匀厚度薄膜的广泛沉积。

公开(公告)号：EP3195344B1

公开(公告)日：2020-08-26

申请号：EP15794291.3

申请日：2015-09-18

Applicant: Plasma App Ltd.

Inventor： YARMOLICH, Dmitry

IPC: H01J37/34 ,  C23C14/34 ,  H01J3/02 ,  H01J37/077 ,  H01J37/32

公开(公告)号：EP3195344A1

公开(公告)日：2017-07-26

申请号：EP15794291.3

申请日：2015-09-18

Applicant: Plasma App Ltd.

Inventor： YARMOLICH, Dmitry

IPC: H01J37/34 ,  C23C14/34 ,  H01J3/02 ,  H01J37/077 ,  H01J37/32

Abstract: A virtual cathode deposition apparatus utilises virtual plasma cathode for generation of high density electron beam to ablate a solid target. A high voltage electrical pulse ionizes gas to produce a plasma which temporarily appears in front of the target and serves as the virtual plasma cathode at the vicinity of target. This plasma then disappears allowing the ablated target material in a form of a plasma plume to propagate toward the substrate. Several virtual cathodes operating in parallel provide plumes that merge into a uniform plasma which when condensing on a nearby substrate leads to wide area deposition of a uniform thickness thin film.

Abstract translation: 虚拟阴极沉积设备1利用虚拟等离子体阴极产生高密度电子束以烧蚀固体靶115.空心阴极101位于基板保持器和靶保持器117之间。等离子体供给到靶的侧面 115被消融。 高压脉冲被施加到空心阴极101，使得当等离子体被供应到空心阴极101时，形成虚拟阴极（虚拟器），其产生电子束，该电子束击中包括沉积材料的靶115 ，该材料被烧蚀并且所述材料的羽流穿过空心阴极101，以在衬底125上形成薄层。等离子体可以由空心帽电极105和气体供应源123供应，气体通过狭缝 129在气室127中。