Abstract:
A capacitor (21; 31; 41) comprising: a substrate (22); a bottom plate, which extends over the substrate and includes a first conductive layer (28); a top plate, which extends over the bottom plate and includes a second conductive layer (46); a contact region (42), electrically coupled to the first conductive layer (28); and a first dielectric layer (38) including a first dielectric region (48), which extends between the bottom plate and the top plate, and a second dielectric region, which extends between the first dielectric region and the contact region (42), the first and second dielectric regions being adjacent to one another. The second dielectric region has a surface (38a) having a plurality of grooves designed to increase the extension of a surface path between the second conductive layer (46) and the contact region (42).
Abstract:
A capacitor (21; 31; 41) comprising: a substrate (22); a bottom plate, which extends over the substrate and includes a first conductive layer (28); a top plate, which extends over the bottom plate and includes a second conductive layer (46); a contact region (42), electrically coupled to the first conductive layer (28); and a first dielectric layer (38) including a first dielectric region (48), which extends between the bottom plate and the top plate, and a second dielectric region, which extends between the first dielectric region and the contact region (42), the first and second dielectric regions being adjacent to one another. The second dielectric region has a surface (38a) having a plurality of grooves designed to increase the extension of a surface path between the second conductive layer (46) and the contact region (42).
Abstract:
A radiation detector ( 105 ) of the ΔE-E type is proposed. The detector is integrated in a chip ( 205 ) of semiconductor material with a front surface ( 216 ) and a back surface ( 215 ) opposite the front surface, the detector having at least one detection cell ( 236 ) arranged on the front surface for receiving a radiation to be evaluated, wherein the detector includes: a first region ( 224,240,263 ) of a first type of conductivity extending into the chip from the front surface to a first depth; a second region ( 220,235 ) of a second type of conductivity extending into the chip from the back surface to a second depth so as to reach the first region; and for each detection cell a third region ( 255 ) of the second type of conductivity extending into the first region from the front surface to a third depth lower than the first depth and the second depth, a thin sensitive volume for absorbing energy from the radiation being defined by a junction between the first region and each third region, and a thick sensitive volume for absorbing further energy from the radiation being defined by a farther junction between the first region and the second region. For each detection cell the detector further includes insulation means ( 270 ) arranged around the third region and extending from the front surface into the first region to an insulation depth comprised between the first depth and the third depth.