公开(公告)号：DE3152516A1

公开(公告)日：1982-12-02

申请号：DE3152516

申请日：1981-11-18

Applicant: MASUHARA HIDEKAZU ,  IMAI YOSHIO ,  KADOMA YOSHINORI ,  UEDA MITSURU

Inventor： MASUHARA EIICHI ,  IMAI YOSHIO ,  KADOMA YOSHINORI ,  UEDA MITSURU

IPC: A61C5/00 ,  C08F20/02

公开(公告)号：WO2011081175A3

公开(公告)日：2011-10-20

申请号：PCT/JP2010073690

申请日：2010-12-28

Applicant: UEDA MITSURU

Inventor： UEDA MITSURU

IPC: A45B3/00

CPC classification number: A45B23/00 ,  A45B25/00 ,  A45B2200/1036

Abstract: Disclosed is a parasol which can be opened/closed and a fan device which can maintain sufficient placement space for a fan, and maintain a sufficient amount of airflow without the fan being a nuisance. The parasol (1) is provided with: a hollow shaft (3); a cylindrical lathe (4) which is disposed on the outside of the shaft (3), and which slides relative to the shaft (3) in the axial direction (S1) thereof when the parasol (1) is opened and closed; a first fan (11) which is disposed inside the shaft (3) and which generates air; and air outlets (191, 192, 193, 194, 195, 196) which transmit the air generated by the first fan (11) to inside the parasol (1).

Abstract translation: 本发明公开了一种可打开/关闭的遮阳伞和一种风扇装置，该风扇装置可以为风扇保持足够的放置空间，并且保持足够的气流量而不会造成麻烦。 伞（1）具有：中空轴（3）; 一个设置在轴（3）外侧的圆柱形车床（4），当伞（1）打开和关闭时，该圆柱形车床在其轴向（S1）上相对于轴（3）滑动; 第一风扇（11），其设置在所述轴（3）的内部并且产生空气; 和将由第一风扇（11）产生的空气传送到太阳伞（1）内部的空气出口（191,192,193,194,195,196）。

公开(公告)号：WO2004036315B1

公开(公告)日：2004-06-03

申请号：PCT/JP0311137

申请日：2003-09-01

Applicant: IDEMITSU KOSAN CO ,  UEDA MITSURU ,  ISHII HIROTOSHI

Inventor： UEDA MITSURU ,  ISHII HIROTOSHI

IPC: C07C43/253 ,  C07C69/712 ,  C07C69/736 ,  C07C69/96 ,  C07D309/04 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  C07C39/17

CPC classification number: G03F7/0045 ,  C07C43/253 ,  C07C69/712 ,  C07C69/736 ,  C07C69/96 ,  C07C2603/74 ,  C07D309/04 ,  G03F7/0392

Abstract: Photoresist base materials consisting of extreme ultraviolet sensitive organic compounds represented by the general formula (1): (1) [wherein A is a central structure consisting of an aliphatic group having 1 to 50 carbon atoms, an aromatic group having 6 to 50 carbon atoms, an organic group bearing both, or an organic group having a cyclic structure formed by repetition of these groups; B to D are each an extreme ultraviolet sensitive group, a group exhibiting a reactivity on the action of a chromophore sensitive to extreme ultraviolet rays, a C1-50 aliphatic or C6-50 aromatic group having such a group, an organic group having both groups, or a substituent having a branched structure; X to Z are each a single bond or an ether linkage; l to n are integers of 0 to 5 satisfying the relationship: l + m + n > 1; and A to D may each have a heteroatom-bearing substituent]. The invention provides photoresist base materials and photoresist compositions which enable ultrafine lithography with extreme ultraviolet rays or the like.

Abstract translation: （1）所示的极端紫外线敏感性有机化合物构成的光致抗蚀剂基材：（1）[其中，A是由碳原子数1〜50的脂肪族基团，碳原子数6〜50的芳香族基团 带有两者的有机基团或具有通过重复这些基团形成的环状结构的有机基团; B至D各自是极端紫外线敏感性基团，对极端紫外线敏感的发色团的作用表现出反应性的基团，具有这种基团的C1-50脂族或C6-50芳族基团，具有两个基团的有机基团 ，或具有支化结构的取代基; X至Z各自为单键或醚键; l至n是满足以下关系的0至5的整数：l + m + n> 1; 并且A至D可各自具有带有杂原子的取代基]。 本发明提供了能够利用极紫外线等进行超细光刻的光刻胶基材和光刻胶组合物。

公开(公告)号：JP2001072768A

公开(公告)日：2001-03-21

申请号：JP24991799

申请日：1999-09-03

Applicant: OISHI YOSHIYUKI ,  UEDA MITSURU ,  NISSAN CHEMICAL IND LTD

Inventor： OISHI YOSHIYUKI ,  UEDA MITSURU ,  NIHEI TAKAYASU ,  TAI HIROYOSHI

IPC: C08G73/10

Abstract: PROBLEM TO BE SOLVED: To easily produce an aliphatic polyimide, regardless of the structure of the aliphatic tetracarboxylic dianhydride, by reacting a bissilylated diamine derivative with an aliphatic tetracarboxylic dianhydride in an organic solvent and cyclizing the resultant poilyamic acid ester. SOLUTION: A bissilylated diamine derivative represented by formula II, wherein R2 is a divalent organic group constituting a diamine; and R3 is a monovalent organosilicon group, is reacted with a tetracarboxylic dianhydride represented by formula III, wherein R1 is a tetravalent organic group constituting an aliphatic tetracarboxylic acid in an organic solvent to give a polyamic acid ester containing repeating units represented by formula IV, wherein m is a positive integer; and R1, R2, and R3 are each the same in formula II or III, which is cyclized to give a polymide which contains repeating units represented by formula I, wherein m, R1, and R2 are each the same as described above and of which the logarithmic viscosity of the corresponding polyamic acid ester (in an organic solvent at 30 deg.C, with a concentration of 0.5 g/dl) is 0.05-5.0 dl/g.

公开(公告)号：JPH04331227A

公开(公告)日：1992-11-19

申请号：JP10084991

申请日：1991-05-02

Applicant: UEDA MITSURU

Inventor： UEDA MITSURU

IPC: C08G61/10 ,  C08G61/00

Abstract: PURPOSE:To produce inexpensively a polymer composed of directly bonded aromat rings and having avrel excellent mechanical strengths and heat resistance and a high molecular weight. CONSTITUTION:A process for producing an organic polymer composed of directly bonded aromatic rings by using a substituted benzene having an alkyl, alkoxy or hydroxy-alkyl substituent as a monomer, wherein the monomer is polymerized by using an iron (III) salt as an oxidizing agent in a solvent common to the monomer and the oxidizing agent.