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公开(公告)号：JP2009092674A
公开(公告)日：2009-04-30
申请号：JP2008333252
申请日：2008-12-26
Inventor： ISOMURA IKUNAO
IPC: G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66
Abstract: PROBLEM TO BE SOLVED: To provide a device, method and program for inspecting a sample with appropriate accuracy.
SOLUTION: The sample inspection device compares a plurality of partial optical image data in an identical, patterned sample to be inspected. The sample inspection device includes an optical image data acquisition section 150 for acquiring the optical image data of the sample to be inspected; and a comparison circuit 108 for comparing the plurality of partial, optical image data. In the comparison circuit 108, when region image data generated based on information on a region pattern, indicating a prescribed region are input and the plurality of partial, optical image data are compared, determination conditions are changed by referring to the region image data, thus the presence of defects on the sample is determined.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：提供用于以适当的精度检查样品的装置，方法和程序。 解决方案：样品检查装置将待检查的相同的图案化样品中的多个部分光学图像数据进行比较。 样本检查装置包括：光学图像数据获取部分150，用于获取被检样本的光学图像数据; 以及用于比较多个部分光学图像数据的比较电路108。 在比较电路108中，当输入表示规定区域的区域图案的信息而生成的区域图像数据并且比较多个部分光学图像数据时，通过参照区域图像数据来改变确定条件 确定样品中缺陷的存在。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009033285A
公开(公告)日：2009-02-12
申请号：JP2007192895
申请日：2007-07-25
Applicant: Advanced Mask Inspection Technology Kk , Toshiba Corp , アドバンスド・マスク・インスペクション・テクノロジー株式会社 , 株式会社東芝
Inventor： INOUE HIROSHI , OGAWA TSUTOMU
IPC: H01L27/148 , H04N1/04 , H04N1/10 , H04N1/107 , H04N5/335 , H04N5/341 , H04N5/369 , H04N5/3728 , H04N5/376
Abstract: PROBLEM TO BE SOLVED: To improve resolution in the TDI direction of an optical pattern image when inputting the image of a pattern using a storage type (TDI) sensor.
SOLUTION: An image inputting device 30 has characteristically important sections including the TDI sensor 10 fixed and placed onto a support substrate 31, a TDI sensor movement mechanism 32 for giving periodic position movement to the support substrate 31, and a TDI sensor movement control circuit 33 for controlling the sensor movement drive section 32. There are a TDI synchronous control circuit 18, a sensor drive circuit 19, a sensor output I/F 21, and an A/D conversion circuit 22. In this case, the TDI sensor 10 periodically moves in the TDI direction to cancel the deviation of the relative position of a stored charge transferred in the TDI direction of the TDI sensor 10.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：使用存储型（TDI）传感器输入图案的图像时，提高光学图案图像的TDI方向的分辨率。 解决方案：图像输入装置30具有固定并放置在支撑基板31上的TDI传感器10的特征性重要部分，用于给予支撑基板31周期性位置运动的TDI传感器运动机构32和TDI传感器运动 用于控制传感器移动驱动部分32的控制电路33.存在TDI同步控制电路18，传感器驱动电路19，传感器输出I / F 21和A / D转换电路22.在这种情况下，TDI 传感器10周期性地沿着TDI方向移动以消除在TDI传感器10的TDI方向上传送的存储电荷的相对位置的偏差。（C）2009年，JPO和INPIT
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公开(公告)号：JP2008249454A
公开(公告)日：2008-10-16
申请号：JP2007090423
申请日：2007-03-30
Inventor： HIRONO MASATOSHI
IPC: G01N21/84 , G01N21/956 , G02B3/06 , H01L21/027
CPC classification number: G02B27/0905 , G01N21/8806 , G01N21/956 , G01N2021/95676 , G02B27/0961 , G02B27/0966 , G03F1/84 , G03F7/70075 , G03F7/70141
Abstract: PROBLEM TO BE SOLVED: To provide an illumination optical device and a sample inspection device adjustable easily because of being constituted of a small number of components, using a far-ultraviolet light source having high illuminance and high illuminance uniformity on an irradiation surface.
SOLUTION: The illumination optical device and the sample inspection device are characterized by being equipped respectively with the far-ultraviolet light source for emitting a far-ultraviolet ray; the first double-sided cylindrical lens entered by the far-ultraviolet ray, emitting the ray in the divided state into the first plurality of light fluxes, having a constitution wherein a cylindrical axis crosses orthogonally, and having each cylindrical lens array on both surfaces; the second double-sided cylindrical lens entered by the first plurality of light fluxes emitted from the first double-sided cylindrical lens, emitting the light fluxes as the second plurality of light fluxes after aligning each direction of the first plurality of light fluxes, having a constitution wherein a cylindrical axis crosses orthogonally, and having each cylindrical lens array on both surfaces; and a condenser lens entered by the second plurality of light fluxes, and piling the second plurality of light fluxes.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：为了提供一种照明光学装置和样品检查装置，其由于由少量的部件构成，可以容易地调节，使用在照射表面上具有高照度和高照度均匀性的远紫外光源 。 解决方案：照明光学装置和样品检查装置的特征在于分别配备有用于发射远紫外线的远紫外光源; 通过远紫外线进入的第一双面圆柱透镜，将分光状态的光线发射到第一多个光束中，具有圆柱轴正交交叉并且在两面具有每个柱面透镜阵列的构造; 所述第二双面柱面透镜由从所述第一双面圆柱透镜发射的所述第一多个光束进入，在对准所述第一多个光束的每个方向之后，发射所述光束作为所述第二多个光束，具有 其中圆柱轴正交交叉并且在两个表面上具有每个柱面透镜阵列的构造; 以及由第二多个光束进入的聚光透镜，并且堆叠第二多个光束。 版权所有（C）2009，JPO＆INPIT
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94.发明专利Sample inspecting device, and corrected image generating method and program 审中-公开样本检查设备和校正图像生成方法和程序
公开(公告)号：JP2008233343A
公开(公告)日：2008-10-02
申请号：JP2007070398
申请日：2007-03-19
Inventor： YAMASHITA KYOJI
IPC: G03F1/84
CPC classification number: G06K9/32 , G01N21/95607 , G03F1/84 , G06T7/001 , G06T7/32 , G06T2207/10056 , G06T2207/30148
Abstract: PROBLEM TO BE SOLVED: To provide an inspecting device which performs positioning of higher accuracy through operations, based on a smaller number of parameters. SOLUTION: The sample inspecting device as an embodiment of the present invention comprises an optical image acquiring unit 150, which acquires an optical image of a sample to be inspected which has a pattern formed; a reference circuit 112 which generates a reference image to be compared with the optical image; a least-squares method parameter arithmetic unit 370, which computes respective parameters by a method of least squares using a model expression including, as the respective parameters, quantities of parallel movement from positions, aligned loosely in pixel units, of the optical image and reference image; an enlargement/reduction error coefficient, a rotation error coefficient, a constant of a grayscale value, and an image intensity variation rate; a corrected image generating circuit 390 which generates a corrected image, by shifting positions of the reference image by quantities of position shifts from positions loosely aligned in pixel units on the basis of the respective parameters, and a comparison circuit 108 which compares the corrected image with the optical image. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种基于较少数量的参数，通过操作执行更高精度的定位的检查装置。 ＆lt; P＆gt;解决方案：作为本发明的实施例的样本检查装置包括光学图像获取单元150，其获取具有形成图案的待检查样本的光学图像; 产生与光学图像进行比较的参考图像的参考电路112; 最小二乘法参数运算单元370，其通过使用模型表达式的最小二乘法来计算各个参数，该模型表达式包括作为相应参数的光学图像和参考的宽度以像素单位对齐的位置的平行移动量 图片; 放大/缩小误差系数，旋转误差系数，灰度值的常数和图像强度变化率; 校正图像生成电路390，其基于各个参数，通过以基于像素单位的松散对准的位置移位参考图像的位置，从而生成校正图像;以及比较电路108，其将校正图像与 光学图像。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2008233342A
公开(公告)日：2008-10-02
申请号：JP2007070397
申请日：2007-03-19
Inventor： OGAWA TSUTOMU
CPC classification number: G02B7/32 , G01N21/9501
Abstract: PROBLEM TO BE SOLVED: To reduce an error due to an effect of a refractive index distribution and an error due to an effect of diffracted light.
SOLUTION: A height detecting device 100 includes a lighting slit 210 having a first rectangular opening bored to pass illumination light 104, optical systems 200 and 222 which illuminate a surface of an object 101 with illumination light passed through the lighting slit 210 and images reflected light from the surface of the object 101, detection slits 230 and 240 which are installed before and behind an imaging point and have second opening parts bored so that widths of the rectangles may be shorter than the width of a lighting slit image and lengths may be longer than the length of the lighting slit image, light quantity sensors 252 and 254 which detect quantities of reflected light passed through the detection slits 230 and 240, and an arithmetic circuit 260 which computes the height of the surface of the object 101 on the basis of outputs of the light quantity sensors 252 and 254.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：减少由折射率分布的影响引起的误差和由于衍射光的影响引起的误差。 解决方案：高度检测装置100包括具有通过照明光104的第一矩形开口的照明狭缝210以及照亮通过照明狭缝210的照明光照射物体101的表面的光学系统200和222;以及 图像反射来自物体101的表面的光，检测狭缝230和240，其安装在成像点之前和之后，并且具有钻孔的第二开口部分，使得矩形的宽度可以短于照明狭缝图像的宽度和长度 可以长于照明狭缝图像的长度，检测通过检测狭缝230和240的反射光的量的光量传感器252和254以及计算物体101的表面的高度的运算电路260 光量传感器252和254的输出的基础。版权所有（C）2009，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：JP2008165198A
公开(公告)日：2008-07-17
申请号：JP2007297856
申请日：2007-11-16
Inventor： MURAKAMI SHINGO , MATSUMURA KENICHI , UMEDA TAKUO , SAITO YASUKO
IPC: G01B11/24 , G01N21/956 , G03F1/84 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To improve pattern inspection accuracy for an inspection sample.
SOLUTION: A pattern inspection device is provided with: an optical image acquiring unit to acquire the optical image of the pattern of an inspection sample; an alignment processing unit to carry out an alignment process including correction processing of the optical image by a reference image; and a comparing unit to compare optical images different from each other subjected to the alignment process.
COPYRIGHT: (C)2008,JPO&INPITAbstract translation: 要解决的问题：提高检验样品的图案检查精度。 解决方案：图案检查装置设置有：光学图像获取单元，用于获取检查样本的图案的光学图像; 对准处理单元，用于执行包括通过参考图像的光学图像的校正处理的对准处理; 以及比较单元，用于比较经过对准处理的彼此不同的光学图像。 版权所有（C）2008，JPO＆INPIT
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97.发明专利
公开(公告)号：JP2008051617A
公开(公告)日：2008-03-06
申请号：JP2006227348
申请日：2006-08-24
Inventor： OOAKI JIYUNJI
IPC: G01N21/956 , G01B11/24 , G03F1/84 , G06T1/00 , G06T7/00
CPC classification number: G06T7/001 , G06K9/6212 , G06T2207/30148
Abstract: PROBLEM TO BE SOLVED: To provide an image inspection device constituted so as to unite alignment and image correction using the image divided in a frequency region and based on effective image correction reduced in image deterioration and a set parameter. SOLUTION: The image inspection device for performing the comparative inspection of inspection reference image and an image to be inspected is equipped with an image dividing part for forming frequency-divided images divided to a plurality of frequency regions with respect to the inspection reference image and the image to be inspected, a model parameter identifying part for identifying a model parameter using the two-dimensional linear estimate model of the inspection reference image and the image to be inspected with respect to the respective frequency-divided images, a model image forming part for forming a model image based on the identified model parameter and a comparing processing part for performing the comparative inspection of the model image and the image to be inspected with respect to the respective frequency-divided images. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供一种图像检查装置，其构成为使用在频率区域中划分的图像并且基于图像劣化中减少的有效图像校正和设定参数来组合对准和图像校正。 解决方案：用于执行检查参考图像和待检查图像的比较检查的图像检查装置配备有图像分割部分，用于将分割图像划分为相对于检查参考的多个频率区域 图像和要检查的图像，使用所述检查参考图像的二维线性估计模型和要被检查的图像相对于各个分频图像来识别模型参数的模型参数识别部分，模型图像 形成用于基于所识别的模型参数形成模型图像的部分;以及比较处理部分，用于相对于各个分频图像执行模型图像和待检查图像的比较检查。 版权所有（C）2008，JPO＆INPIT
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98.发明专利Image correction device, pattern inspection device, image correction method, and pattern inspection method 有权图像校正装置，图案检查装置，图像校正方法和图案检查方法
公开(公告)号：JP2007086533A
公开(公告)日：2007-04-05
申请号：JP2005276583
申请日：2005-09-22
Inventor： OOAKI JIYUNJI , SUGIHARA SHINJI , NAKATANI YUICHI
IPC: G03F1/84
CPC classification number: G03F7/7065 , G03F1/84 , G03F7/705 , G06T7/0004
Abstract: PROBLEM TO BE SOLVED: To provide image correction and pattern inspection similarly effective even for an extremely sparse pattern image to a dense pattern image in a pattern inspection device such as a reticle inspection device. SOLUTION: The invention provides an image correction device that is equipped with: a pattern cutting section to cut out a pattern as a paste pattern from each region of an inspection reference pattern image and an objective inspection pattern image where the pattern is present; a pattern pasting section to paste the paste pattern in an empty region where no pattern is present in each of the inspection reference pattern image and the objective inspection pattern image to produce a pasted inspection reference pattern image and a pasted objective inspection pattern image; a simultaneous equation generating section to generate a simultaneous equation from a linear prediction model on the pasted inspection reference pattern image and the pasted objective inspection pattern image; a parameter generating section to solve the simultaneous equation to obtain model parameters; and a corrected pattern image generating section to apply the linear prediction model using the model parameters on the pattern image to generate a corrected pattern image. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：即使对于诸如标线检查装置的图案检查装置中的密集图案图像，甚至对于非常稀疏的图案图像也提供类似有效的图像校正和图案检查。 解决方案：本发明提供了一种图像校正装置，其配备有：图案切割部，用于从检查参考图案图像的每个区域和存在图案的客观检查图案图像切出作为糊图案的图案 ; 图案粘贴部分，用于将粘贴图案粘贴在每个检查参考图案图像和客观检查图案图像中不存在图案的空区域中，以产生粘贴的检查参考图案图像和粘贴的客观检查图案图像; 一个联立方程生成部分，用于在粘贴的检查参考图案图像和粘贴的目标检查图案图像上从线性预测模型生成联立方程; 参数产生部分，用于求解模型参数的联立方程; 以及校正图案图像生成部，其使用所述模型参数对所述图案图像应用所述线性预测模型，以生成校正图案图像。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2007086100A
公开(公告)日：2007-04-05
申请号：JP2005271306
申请日：2005-09-20
Inventor： IMAI SHINICHI
IPC: G01N21/956 , G03F1/84 , H01L21/027
CPC classification number: G01N21/95607 , G01N21/9501 , G01N2021/95615 , G02F1/3534 , G02F1/37 , G02F2001/354
Abstract: PROBLEM TO BE SOLVED: To provide a pattern inspection apparatus which is more resistant to vibration and has high reliability.
SOLUTION: The pattern inspection apparatus 200 is equipped with: a fundamental wave light source (1) 310 emitting a fundamental wave (1) having a wavelength of 1064 nm; a fundamental wave light source (2) 320 emitting a fundamental wave (2) having a wavelength of 1562 nm; a wavelength conversion section 330 generating a deep ultraviolet light having a wavelength of 198 nm based on the fundamental wave (1) and the fundamental wave (2); an optical fiber 342 for the fundamental wave (1); an optical fiber 344 for the fundamental wave (2); and a pattern inspection section 100 on which the wavelength conversion section 330 is mounted and which inspects a pattern of a sample to be inspected by using the deep ultraviolet light generated by the wavelength conversion section 330 as illuminating light.
COPYRIGHT: (C)2007,JPO&INPITAbstract translation: 要解决的问题：提供一种更耐振动并且具有高可靠性的图案检查装置。 解决方案：图案检查装置200配备有：发射波长为1064nm的基波（1）的基波光源（1）310; 发射波长为1562nm的基波（2）的基波光源（2）320; 波长转换部分330，生成基于基波（1）和基波（2）的波长为198nm的深紫外光; 用于基波（1）的光纤342; 用于基波（2）的光纤344; 以及安装了波长转换部分330的图案检查部分100，并且通过使用由波长转换部分330产生的深紫外光作为照明光来检查要检查的样本的图案。 版权所有（C）2007，JPO＆INPIT
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100.发明专利Image correction device, pattern inspection device, image correction method, and pattern defect inspection method 有权图像校正装置，图案检查装置，图像校正方法和图形缺陷检查方法
公开(公告)号：JP2007085944A
公开(公告)日：2007-04-05
申请号：JP2005276582
申请日：2005-09-22
Inventor： OOAKI JIYUNJI , SUGIHARA SHINJI
IPC: G01N21/956 , G01B11/24 , G06T1/00
CPC classification number: G06T7/001 , G06T2207/30164
Abstract: PROBLEM TO BE SOLVED: To provide effective image correction capable of adapting automatically the density of a pattern image of an inspection objective sample. SOLUTION: This image correction device/pattern inspection device identifies a two-dimensional linear model from the pattern image, and conducts switching between a correction pattern image by a two-dimensional linear prediction model and an interpolation correction image by bi-three-dimensional interpolation, using an eccentric amount in a gravity center position of the identified two-dimensional linear model. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供能够自动适应检查对象样本的图案图像的密度的有效的图像校正。 解决方案：该图像校正装置/图案检查装置从图案图像识别二维线性模型，并通过二维线性预测模型和内插校正图像之间的二三线性进行校正图案图像之间的切换 在所识别的二维线性模型的重心位置使用偏心量。 版权所有（C）2007，JPO＆INPIT
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