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公开(公告)号：JP2010078386A
公开(公告)日：2010-04-08
申请号：JP2008245090
申请日：2008-09-25
Inventor： KOBAYASHI NOBORU , KOGURE YOSHINAGA , TAKAHARA KENICHI , KIKUIRI NOBUTAKA
IPC: G01B11/00 , G03F7/20 , H01L21/027 , H01L21/68
CPC classification number: G01B11/03 , G01B21/045
Abstract: PROBLEM TO BE SOLVED: To provide an X-Y stage system capable of reducing a length-measurement error due to air fluctuation by including a length-measurement light path tube mechanism for adequately covering a length-measurement light path of a laser interferometer in its X-Y stage having a position length measurement part moving in X/Y directions by the laser interferometer. SOLUTION: The X-Y stage system includes: the stage moving in the X/Y directions; the laser interferometer for conducting the length measurement of a position of the stage; and the length-measurement light path tube mechanism having a fixed tube which is disposed on the laser interferometer side of the length-measurement light path and fixed to the laser interferometer so as to cover at least a portion of the length-measurement light path between the stage and the laser interferometer, and having a movable tube which is disposed on the stage side of the length-measurement light path so as to cover at least a portion of the length-measurement light path and moves along with a motion of the stage, wherein one end of the fixed tube or the movable tube is inserted into one end of the other tube. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供一种能够通过包括用于充分覆盖激光干涉仪的长度测量光路的长度测量光路管机构来减少由于空气波动引起的长度测量误差的XY平台系统 其XY台具有通过激光干涉仪在X / Y方向上移动的位置长度测量部。
解决方案：X-Y舞台系统包括：舞台沿X / Y方向移动; 所述激光干涉仪用于对所述平台的位置进行长度测量; 所述长度测量光路管机构具有固定管，所述固定管设置在所述长度测量光路的所述激光干涉仪侧并固定到所述激光干涉仪，以便覆盖所述长度测量光路的至少一部分， 舞台和激光干涉仪，并且具有可动管，其设置在长度测量光路的舞台侧，以便覆盖长度测量光路的至少一部分并随着舞台的运动而移动 其中固定管或可动管的一端插入另一管的一端。 版权所有（C）2010，JPO＆INPIT
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公开(公告)号：JP2009222623A
公开(公告)日：2009-10-01
申请号：JP2008068917
申请日：2008-03-18
Inventor： HIRANO RYOICHI
IPC: G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66
Abstract: PROBLEM TO BE SOLVED: To provide an image sampling device and sample inspection device for preventing disturbance, especially for blocking radiation such as cosmic rays.
SOLUTION: The image sampling device and sample inspection device include a light source for irradiating a sample having a pattern, a sensor for receiving the light radiated from the light source to the sample and sampling a pattern image, an optical path changing body that is arranged in front of the sensor and bends an optical path, and a blocking body that surrounds the optical path and blocks the radiation coming into the sensor.
COPYRIGHT: (C)2010,JPO&INPITAbstract translation: 要解决的问题：提供一种用于防止干扰的图像采样装置和样品检查装置，特别是用于阻挡诸如宇宙射线的辐射。 解决方案：图像取样装置和样本检查装置包括用于照射具有图案的样本的光源，用于将从光源照射的光接收到样本并对样本图像进行采样的传感器，光路改变体 其布置在传感器的前面并弯曲光路，以及围绕光路并阻挡进入传感器的辐射的阻挡体。 版权所有（C）2010，JPO＆INPIT
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3.发明专利Correction pattern image generation device, pattern inspection apparatus, and correction pattern image generation method 有权校正图形图像生成装置，图案检查装置和校正图案图像生成方法
公开(公告)号：JP2009198440A
公开(公告)日：2009-09-03
申请号：JP2008042997
申请日：2008-02-25
Inventor： SUGIHARA SHINJI
IPC: G01N21/956 , G06T1/00
CPC classification number: G06T7/001 , G03F1/84 , G06T2207/10061 , G06T2207/30148
Abstract: PROBLEM TO BE SOLVED: To provide a device and a method for generating a corrected image obtained by appropriately correcting the image of an inspection reference pattern to appropriately inspect a pattern image to be inspected in a sample to be inspected.
SOLUTION: The correction pattern image generation device for inspecting a pattern comprises: a first pattern compositing section for compositing an assist pattern image and a pattern image to be inspected for generating a pattern image to be inspected having an assist pattern; an assist pattern shift processing section; a second pattern compositing section for generating an inspection reference pattern image having an assist pattern by compositing the shifted assist pattern image and an inspection reference pattern image; a model generation section for generating a position shift model by using the pattern image to be inspected having the assist pattern and the inspection reference pattern image having the assist pattern; and a correction pattern image operation section for correcting the inspection reference pattern image.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：提供一种用于生成通过适当地校正检查参考图案的图像而获得的校正图像以适当地检查待检查样本中的待检查的图案图像的装置和方法。 解决方案：用于检查图案的校正图案图像生成装置包括：第一图案合成部，其用于合成辅助图案图像和待检查的图案图像，以生成具有辅助图案的待检查图案图像; 辅助图案移位处理部; 第二图案合成部分，用于通过合成所述移动的辅助图案图像和检查参考图案图像来生成具有辅助图案的检查参考图案图像; 模型生成部，其通过使用具有辅助图案的被检查图案图像和具有辅助图案的检查基准图案图像来生成位置偏移模型; 以及校正图案图像操作部分，用于校正检查参考图案图像。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009175749A
公开(公告)日：2009-08-06
申请号：JP2009074776
申请日：2009-03-25
Inventor： IMAI SHINICHI
IPC: G03F1/84 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To provide a pattern inspection apparatus having high reliability and higher resistance to vibration.
SOLUTION: The pattern inspection apparatus 200 includes: a fundamental wave light source (1) 310 emitting a fundamental wave (1) having a wavelength of 1,064 nm; a fundamental wave light source (2) 320 emitting a fundamental wave (2) at a wavelength of 1,562 nm; a wavelength conversion section 330 generating deep UV rays having a wavelength of 198 nm on the basis of the fundamental wave (1) and the fundamental wave (2); an optical fiber 342 for the fundamental wave (1); an optical fiber 344 for the fundamental wave (2); and a pattern inspection section 100 mounting the wavelength conversion section 330 and inspecting a pattern of an inspection target sample by using the deep UV rays generated by the wavelength conversion section 330 as illumination light.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：提供一种具有高可靠性和较高抗振性的图案检查装置。 解决方案：图案检查装置200包括：发射波长为1,064nm的基波（1）的基波光源（1）310; 发射波长为1,562nm的基波（2）的基波光源（2）320; 波长转换部分330，基于基波（1）和基波（2）产生具有198nm波长的深紫外线; 用于基波（1）的光纤342; 用于基波（2）的光纤344; 以及图案检查部100，其安装波长转换部330，并通过使用由波长转换部330生成的深紫外线作为照明光来检查检查对象样本的图案。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009139166A
公开(公告)日：2009-06-25
申请号：JP2007314297
申请日：2007-12-05
Inventor： NAKATANI YUICHI
IPC: G01N21/956 , G01B11/24 , G06T1/00
Abstract: PROBLEM TO BE SOLVED: To provide an image flaw inspection device for determining an image flaw with high precision even in the case where difference occurs in a part of a region, and to provide an image flaw inspection method.
SOLUTION: The flaw inspection method of a pattern for comparing an image signal photoelectrically converted from a certain object to be inspected with a reference image to inspect it includes the first image correction step S41 of correcting the reference image to obtain a first corrected image, the first flaw inspection step S42 of detecting a flaw using the image signal and the first corrected image to calculate flaw coordinates, the weighted image calculation step S43 of obtaining a weighted image from the image signal, the first corrected image and the flaw coordinates, the second image correction step S44 of recorrecting the first corrected image using the image signal, the first corrected image and the weighted image to obtain a second corrected image, and the second flaw detection step S45 for detecting the flaw using the image signal and the second corrected image.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：即使在区域的一部分发生差异的情况下，也提供用于高精度地确定图像缺陷的图像缺陷检查装置，并提供图像缺陷检查方法。 解决方案：用于比较从要检查的某个物体光电转换的图像信号与参考图像进行检查的图案的缺陷检查方法包括校正参考图像以获得第一校正的第一图像校正步骤S41 图像，使用图像信号检测缺陷的第一缺陷检查步骤S42和第一校正图像来计算缺陷坐标，从图像信号获得加权图像的加权图像计算步骤S43，第一校正图像和缺陷坐标 ，第二图像校正步骤S44，使用图像信号，第一校正图像和加权图像重新校正第一校正图像以获得第二校正图像;以及第二探伤步骤S45，用于使用图像信号和 第二次校正图像。 版权所有（C）2009，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：JP2008256953A
公开(公告)日：2008-10-23
申请号：JP2007099032
申请日：2007-04-05
Applicant: Advanced Mask Inspection Technology Kk , Megaopto Co Ltd , アドバンスド・マスク・インスペクション・テクノロジー株式会社 , 株式会社メガオプト
Inventor： IMAI SHINICHI , WADA YOSHIO , URATA YOSHIHARU
Abstract: PROBLEM TO BE SOLVED: To attain the substantial beam coupling of a plurality of coherent light sources without being affected by variation in the secular degradation of beam quality for every coherent light source, and to obtain illumination light rays having sufficient light quantity. SOLUTION: The illumination device 200 is provided with: a plurality of coherent light sources 202, 204 each generating coherent light for a plurality of coherent light beams; a plurality of concave mirrors 232, 245 reflecting each coherent light beam with the reflective faces disposed as freely movable; a convex mirror 240 to reflect on one face the plurality of coherent beams reflected from the plurality of concave mirrors 232, 234; and a collimate lens 242 guiding the plurality of coherent beams reflected by the convex mirror 240 to the coaxial direction. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：为了获得多个相干光源的实质的光束耦合而不受每个相干光源的光束质量的长期劣化的变化的影响，并且获得具有足够的光量的照明光线。 解决方案：照明装置200设置有：多个相干光源202,204，每个相干光源202,204为多个相干光束产生相干光; 多个反射镜232,245反射每个相干光束，反射面被设置为可自由移动的; 凸面镜240，用于在一面上反射从多个凹面反射镜232,234反射的多个相干光束; 以及将由凸面镜240反射的多个相干光束引导到同轴方向的准直透镜242。 版权所有（C）2009，JPO＆INPIT
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7.发明专利Correction pattern image generating device and correction pattern image generation method 有权校正图形图像生成装置和校正图形图像生成方法
公开(公告)号：JP2008225416A
公开(公告)日：2008-09-25
申请号：JP2007067826
申请日：2007-03-16
Inventor： SUGIHARA SHINJI
IPC: G01B11/24 , G01N21/956 , G03F1/84 , G06T1/00
Abstract: PROBLEM TO BE SOLVED: To provide a device which generates a corrected image by suitably correcting an image of a sample to be inspected. SOLUTION: A correction pattern image generating unit 200 comprises a means 210 of generating simultaneous equations, based on a first predictive model for image data in arbitrary coordinates; a means 212 of computing coefficients of the simultaneous equations; a means 217 of computing an (x)-directional component element sum and a (y)-directional component element sum of the coefficients; a means 218 of computing (x)-directional component coefficient and (y)-directional component coefficient of the simultaneous equations, based on a second predictive model from the amount of a positional shift between both images; a means 220 of putting together an element sum of a one-directional component, based on the first predictive model and a coefficient of the other directional component, based on the second predictive model; and a means 222 of using the composite coefficient obtained as a coefficient of the simultaneous equations, based on the first predictive model to compute corrected pattern image data in the arbitrary coordinates. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供一种通过适当地校正被检样品的图像来生成校正图像的装置。 解决方案：校正图案图像生成单元200包括基于用于任意坐标的图像数据的第一预测模型生成联立方程的装置210; 计算联立方程的系数的装置212; 计算系数的（x） - 方向分量元素和和（y） - 方向分量元素之和的装置217; 基于来自两个图像之间的位置偏移量的第二预测模型，计算（x）方向分量系数和（y）方向分量系数的装置218; 基于第二预测模型，基于第一预测模型和另一方向分量的系数将单向分量的元素和组合在一起的装置220; 以及基于第一预测模型来使用作为联立方程式的系数获得的复合系数的装置222，以计算任意坐标中的校正图案图像数据。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2008224790A
公开(公告)日：2008-09-25
申请号：JP2007059499
申请日：2007-03-09
Inventor： NAGAO TAKURO , ISOMURA IKUNAO
IPC: G01B11/24 , G01N21/956 , G03F1/84 , G06T1/00
Abstract: PROBLEM TO BE SOLVED: To provide high-speed sample inspection and to shorten the defect inspection processing time, without having to depend on the number of a plurality of layers of a development pattern. SOLUTION: The sample inspection device includes a measurement pattern data acquisition device which acquires measurement pattern data, by detecting transmitted light or reflected light from a sample to be inspected; a development pattern data generation device which generates development pattern data of a plurality of layers from design data on the sample to be inspected; a composite pattern data generation device which extracts pixels of one layer of the development pattern data of the plurality of layers, while regarding as an upper layer development pattern data corresponding to a small area of pixels of the transmitted light or reflected light, and generates composite pattern data corresponding to the measurement pattern data; a layer identification data generating device which generates layer identification data indicative of a layer of pixel-extracted development pattern data of the composite pattern data; a reference pattern data generating device which generates reference pattern data, similar to the measurement pattern data from the composite pattern data and layer identification data; and a comparison device which compares the measured pattern data with the reference pattern data. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供高速样品检查并缩短缺陷检查处理时间，而不必依赖于多层显影图案的数量。 检测装置包括测定图形数据取得装置，通过检测来自检查对象的透射光或反射光，取得测定图形数据; 开发图案数据生成装置，从要检查的样品的设计数据生成多层的显影图案数据; 复合图案数据生成装置，其提取多层的显影图案数据的一层的像素，同时将与透射光或反射光的像素的小面积对应的上层显影图案数据相关联，并生成复合图案数据生成装置 对应于测量图案数据的图案数据; 层识别数据生成装置，其生成表示复合图案数据的像素提取的显影图案数据层的层识别数据; 参考图形数据生成装置，其与来自复合图案数据和层识别数据的测量图案数据类似，生成参照图形数据; 以及将测量的图案数据与参考图案数据进行比较的比较装置。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2008002807A
公开(公告)日：2008-01-10
申请号：JP2006169513
申请日：2006-06-20
Applicant: Advanced Mask Inspection Technology Kk , Topcon Corp , アドバンスド・マスク・インスペクション・テクノロジー株式会社 , 株式会社トプコン
Inventor： OGAWA TSUTOMU , SUZUKI HITOSHI , NAGAHAMA HIROYUKI
IPC: G01B11/24 , G01N21/84 , G01N21/956 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To obtain a uniform illumination light by reducing interference in the illumination device that uses coherent light.
SOLUTION: The illumination device irradiating an objective body with unitized lines of light flux comprises a first dividing part for dividing coherent light into a plurality of lines of light flux by reflecting; first detour optical paths, in which the divided optical flux passes through having optical path difference longer than or equal to the coherent distance; an optical path difference formation material, arranged with at least a part of one first detour optical path making optical path difference larger than or equal to the coherence distance between the first detour optical path that is not arranged with the optical path difference forming material; and a first composite part with the unified plurality of lines of optical flux passing through the first detour optical path.
COPYRIGHT: (C)2008,JPO&INPITAbstract translation: 要解决的问题：通过减少使用相干光的照明装置中的干扰来获得均匀的照明光。 解决方案：照射具有组合的光通量线的物体的照明装置包括：第一分割部分，用于通过反射将相干光分成多束光束; 第一迂回光路，其中分割光通量通过具有长于或等于相干距离的光程差; 光路差形成材料，其配置有至少一部分第一绕道光路，其使光程差大于或等于不与所述光路差形成材料配置的所述第一绕道光路之间的相干距离; 以及具有穿过所述第一绕道光路的所述统一的多条光束的第一复合部分。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2007294564A
公开(公告)日：2007-11-08
申请号：JP2006118843
申请日：2006-04-24
Inventor： KOGURE YOSHINAGA , KATO YOSHIKAZU
IPC: H01L21/027 , G01B11/24 , G03F7/20
Abstract: PROBLEM TO BE SOLVED: To reduce the occurrence of interference fringes in a pattern projector and a pattern inspection device using laser light. SOLUTION: The pattern projector and the pattern inspection device include a laser generator for generating the laser light, a mask having a pattern, an optical system provided between the laser generator and the mask for irradiating the laser light onto the mask and projecting the pattern onto an object, a rotational phase plate provided in the optical system, a driver for rotating the phase plate, and a shock-absorbing medium for preventing vibration from propagating between the phase plate and the optical system. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：减少图案投影仪和使用激光的图案检查装置中的干涉条纹的发生。 图案投影仪和图案检查装置包括用于产生激光的激光发生器，具有图案的掩模，设置在激光发生器和掩模之间的光学系统，用于将激光照射到掩模上并突出 在物体上的图案，设置在光学系统中的旋转相位板，用于旋转相位板的驱动器，以及用于防止振动在相位板和光学系统之间传播的减震介质。 版权所有（C）2008，JPO＆INPIT
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